TY - JOUR
T1 - Dependence of thin-film media microstructure and recording properties on composition of very thin Cr-based seedlayers
AU - Yoshimura, Satoru
AU - Djayaprawira, David D.
AU - Mikami, Masaki
AU - Takakuwa, Yuji
AU - Takahashi, Migaku
N1 - Funding Information:
The authors would like to acknowledge funding support by the Sherman family (to W.E.V.), Eurostars (E!11378; to W.E.V.), Erasmus MC fellowship (to W.E.V.), Deutsche Forschungsgemeinschaft (SPP1629; to H.H.), and Federal Ministry of Education and Research (E-RARE "Thyronerve," to H.H.).
PY - 2002/9
Y1 - 2002/9
N2 - WCr100-X (X = 0-100) and CrTi15 seedlayers with a thickness of 0.5 nm have been utilized to reduce the grain size of CoCrPtB-CrMo longitudinal media. It is found that the media grain size and the media noise are reduced when using WCr100-X (X = 0, 25, 50) seedlayers and not reduced when using CrTi15 or WCr100-X (X = 75, 100) seedlayer. Auger electron spectroscope (AES) analysis results show that the critical thickness just before W, WCr50 and Cr seedlayers become continuous layer are 1.5, 2.5, and 5 nm, respectively. Reflection high-energy electron diffraction (RHEED) analysis shows that the structure of 2.0-nm W film is consisted of very small two-dimensional random oriented crystal grains. This result suggests that W seedlayer, which has the highest melting point, forms a layer-like film with very small and dense island grains, due to its high free surface energy and low mobility. On the other hand, WCr50 and Cr seedlayers, which have a lower melting point than W seedlayer, form island film. It is concluded that WCr100-X (X = 0, 25, 50) seedlayers that have dispersed island film and higher melting point than the nnderlayer are effective to reduce the grain size and the media noise in CoCrPtB-CrMo media.
AB - WCr100-X (X = 0-100) and CrTi15 seedlayers with a thickness of 0.5 nm have been utilized to reduce the grain size of CoCrPtB-CrMo longitudinal media. It is found that the media grain size and the media noise are reduced when using WCr100-X (X = 0, 25, 50) seedlayers and not reduced when using CrTi15 or WCr100-X (X = 75, 100) seedlayer. Auger electron spectroscope (AES) analysis results show that the critical thickness just before W, WCr50 and Cr seedlayers become continuous layer are 1.5, 2.5, and 5 nm, respectively. Reflection high-energy electron diffraction (RHEED) analysis shows that the structure of 2.0-nm W film is consisted of very small two-dimensional random oriented crystal grains. This result suggests that W seedlayer, which has the highest melting point, forms a layer-like film with very small and dense island grains, due to its high free surface energy and low mobility. On the other hand, WCr50 and Cr seedlayers, which have a lower melting point than W seedlayer, form island film. It is concluded that WCr100-X (X = 0, 25, 50) seedlayers that have dispersed island film and higher melting point than the nnderlayer are effective to reduce the grain size and the media noise in CoCrPtB-CrMo media.
KW - Auger electron spectroscope (AES)
KW - Island or layer-like structure
KW - Melting point
KW - Reflection high-energy electron diffraction (RHEED)
KW - Very thin Cr-based seedlayer
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U2 - 10.1109/TMAG.2002.802789
DO - 10.1109/TMAG.2002.802789
M3 - Conference article
AN - SCOPUS:0036763034
SN - 0018-9464
VL - 38
SP - 1958
EP - 1960
JO - IEEE Transactions on Magnetics
JF - IEEE Transactions on Magnetics
IS - 5 I
T2 - 2002 International Magnetics Conference (Intermag 2002)
Y2 - 28 April 2002 through 2 May 2002
ER -