Deposition of multilayered titanium thin film by Nd:YAG laser ablation

T. Nakamura; H. Takahashi; K. Yamamoto; N. Sato; A. Muramatsu; E. Matsubara

Deposition of multilayered titanium thin film by Nd:YAG laser ablation

T. Nakamura, H. Takahashi, K. Yamamoto, N. Sato, A. Muramatsu, E. Matsubara

Tohoku University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Citation (Scopus)

Abstract

TiO₂ and Ti/TiO₂ thin films were deposited on a quartz substrate by laser ablation of TiO₂ and Ti targets using Nd:YAG pulsed laser. After sulfurization of the TiO₂ film in H₂S or CS₂ gas at 1273 K for 1 hour, the surface atomic structure was changed. Furthermore, the Ti/TiO₂ film was successfully prepared by the subsequent ablation of Ti and TiO₂ targets. The morphology and structure of the films were characterized by XRD, XPS and AFM analyses.

Original language	English
Title of host publication	Yazawa International Symposium
Subtitle of host publication	Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies
Editors	F. Kongoli, K. Itagaki, C. Yamauchi, H.Y. Sohn, F. Kongoli, K. Itagaki, C. Yamauchi, H.Y. Sohn
Pages	1241-1246
Number of pages	6
Publication status	Published - 2003
Event	Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Technologies; Materials Processing Fundamentals and New Technologies - San Diego, CA, United States Duration: 2003 Mar 2 → 2003 Mar 6

Publication series

Name	Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies
Volume	1

Conference

Conference	Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Technologies; Materials Processing Fundamentals and New Technologies
Country/Territory	United States
City	San Diego, CA
Period	03/3/2 → 03/3/6

Cite this

Nakamura, T., Takahashi, H., Yamamoto, K., Sato, N., Muramatsu, A., & Matsubara, E. (2003). Deposition of multilayered titanium thin film by Nd:YAG laser ablation. In F. Kongoli, K. Itagaki, C. Yamauchi, H. Y. Sohn, F. Kongoli, K. Itagaki, C. Yamauchi, & H. Y. Sohn (Eds.), Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies (pp. 1241-1246). (Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies; Vol. 1).

Nakamura, T. ; Takahashi, H. ; Yamamoto, K. et al. / Deposition of multilayered titanium thin film by Nd:YAG laser ablation. Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies. editor / F. Kongoli ; K. Itagaki ; C. Yamauchi ; H.Y. Sohn ; F. Kongoli ; K. Itagaki ; C. Yamauchi ; H.Y. Sohn. 2003. pp. 1241-1246 (Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies).

@inproceedings{156be7851c304ffb9edaa62fdbe6a899,

title = "Deposition of multilayered titanium thin film by Nd:YAG laser ablation",

abstract = "TiO2 and Ti/TiO2 thin films were deposited on a quartz substrate by laser ablation of TiO2 and Ti targets using Nd:YAG pulsed laser. After sulfurization of the TiO2 film in H2S or CS2 gas at 1273 K for 1 hour, the surface atomic structure was changed. Furthermore, the Ti/TiO2 film was successfully prepared by the subsequent ablation of Ti and TiO2 targets. The morphology and structure of the films were characterized by XRD, XPS and AFM analyses.",

author = "T. Nakamura and H. Takahashi and K. Yamamoto and N. Sato and A. Muramatsu and E. Matsubara",

year = "2003",

language = "English",

isbn = "0873395468",

series = "Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies",

pages = "1241--1246",

editor = "F. Kongoli and K. Itagaki and C. Yamauchi and H.Y. Sohn and F. Kongoli and K. Itagaki and C. Yamauchi and H.Y. Sohn",

booktitle = "Yazawa International Symposium",

note = "Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Technologies; Materials Processing Fundamentals and New Technologies ; Conference date: 02-03-2003 Through 06-03-2003",

}

Nakamura, T, Takahashi, H, Yamamoto, K, Sato, N, Muramatsu, A & Matsubara, E 2003, Deposition of multilayered titanium thin film by Nd:YAG laser ablation. in F Kongoli, K Itagaki, C Yamauchi, HY Sohn, F Kongoli, K Itagaki, C Yamauchi & HY Sohn (eds), Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies. Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies, vol. 1, pp. 1241-1246, Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Technologies; Materials Processing Fundamentals and New Technologies, San Diego, CA, United States, 03/3/2.

Deposition of multilayered titanium thin film by Nd:YAG laser ablation. / Nakamura, T.; Takahashi, H.; Yamamoto, K. et al.
Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies. ed. / F. Kongoli; K. Itagaki; C. Yamauchi; H.Y. Sohn; F. Kongoli; K. Itagaki; C. Yamauchi; H.Y. Sohn. 2003. p. 1241-1246 (Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies; Vol. 1).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Deposition of multilayered titanium thin film by Nd:YAG laser ablation

AU - Nakamura, T.

AU - Takahashi, H.

AU - Yamamoto, K.

AU - Sato, N.

AU - Muramatsu, A.

AU - Matsubara, E.

PY - 2003

Y1 - 2003

N2 - TiO2 and Ti/TiO2 thin films were deposited on a quartz substrate by laser ablation of TiO2 and Ti targets using Nd:YAG pulsed laser. After sulfurization of the TiO2 film in H2S or CS2 gas at 1273 K for 1 hour, the surface atomic structure was changed. Furthermore, the Ti/TiO2 film was successfully prepared by the subsequent ablation of Ti and TiO2 targets. The morphology and structure of the films were characterized by XRD, XPS and AFM analyses.

AB - TiO2 and Ti/TiO2 thin films were deposited on a quartz substrate by laser ablation of TiO2 and Ti targets using Nd:YAG pulsed laser. After sulfurization of the TiO2 film in H2S or CS2 gas at 1273 K for 1 hour, the surface atomic structure was changed. Furthermore, the Ti/TiO2 film was successfully prepared by the subsequent ablation of Ti and TiO2 targets. The morphology and structure of the films were characterized by XRD, XPS and AFM analyses.

UR - http://www.scopus.com/inward/record.url?scp=0141459649&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0141459649&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0141459649

SN - 0873395468

T3 - Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies

SP - 1241

EP - 1246

BT - Yazawa International Symposium

A2 - Kongoli, F.

A2 - Itagaki, K.

A2 - Yamauchi, C.

A2 - Sohn, H.Y.

A2 - Kongoli, F.

A2 - Itagaki, K.

A2 - Yamauchi, C.

A2 - Sohn, H.Y.

T2 - Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Technologies; Materials Processing Fundamentals and New Technologies

Y2 - 2 March 2003 through 6 March 2003

ER -

Nakamura T, Takahashi H, Yamamoto K, Sato N, Muramatsu A, Matsubara E. Deposition of multilayered titanium thin film by Nd:YAG laser ablation. In Kongoli F, Itagaki K, Yamauchi C, Sohn HY, Kongoli F, Itagaki K, Yamauchi C, Sohn HY, editors, Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies. 2003. p. 1241-1246. (Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies).

Deposition of multilayered titanium thin film by Nd:YAG laser ablation

Abstract

Publication series

Conference

Other files and links

Fingerprint

Cite this