Design and experimental approach of optical reflection filters with graded refractive index profiles

X. Wang; H. Masumoto; Y. Someno; T. Hirai

doi:10.1116/1.581574

Design and experimental approach of optical reflection filters with graded refractive index profiles

X. Wang, H. Masumoto, Y. Someno, T. Hirai

FRIS - Advanced Interdisciplinary Research Division

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22 Citations (Scopus)

Abstract

A novel optical multilayer filter with graded refractive index profiles using a quarterwave stack was designed. This filter exhibits a high reflectance band, a sharp cutoff and a wide transmittance region as the result of sidelobe suppression. A 31 layer TiO₂/SiO₂ high reflectance filter with a graded refractive index profile was fabricated by helicon plasma sputtering on BK7 and Si (100) substrates. The deposition system was operated under ambient gas pressure of 1.8×10^-1 Pa at room temperature. The measured transmittance of the spectrum was in good accord with calculated results. Transmission electron microscopic observations confirmed the expected microstructure of the filter.

Original language	English
Pages (from-to)	206-211
Number of pages	6
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	17
Issue number	1
DOIs	https://doi.org/10.1116/1.581574
Publication status	Published - 1999

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Design and experimental approach of optical reflection filters with graded refractive index profiles

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