Design and fabrication of multichannel Si/SiO2 autocloned photonic crystal edge filters

Yasuo Ohtera; Daniel Kurniatan; Hirohito Yamada

doi:10.1364/AO.50.000C50

Design and fabrication of multichannel Si/SiO₂ autocloned photonic crystal edge filters

Yasuo Ohtera, Daniel Kurniatan, Hirohito Yamada

ENG - Communications Engineering

Tohoku University

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

An Si/SiO₂ multilayer with zigzag layer interfaces is fabricated on a patterned silica substrate using the autocloning method. The multilayer is designed to function as multichannel long-wave pass type edge filters with various cutoff wavelengths. A cutoff wavelength shift of the order of 190nm in the near infrared region (1300-1500 nm) is experimentally demonstrated.

Original language	English
Pages (from-to)	C50-C54
Journal	Applied Optics
Volume	50
Issue number	9
DOIs	https://doi.org/10.1364/AO.50.000C50
Publication status	Published - 2011 Mar 20

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10.1364/AO.50.000C50

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title = "Design and fabrication of multichannel Si/SiO2 autocloned photonic crystal edge filters",

abstract = "An Si/SiO2 multilayer with zigzag layer interfaces is fabricated on a patterned silica substrate using the autocloning method. The multilayer is designed to function as multichannel long-wave pass type edge filters with various cutoff wavelengths. A cutoff wavelength shift of the order of 190nm in the near infrared region (1300-1500 nm) is experimentally demonstrated.",

author = "Yasuo Ohtera and Daniel Kurniatan and Hirohito Yamada",

year = "2011",

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AU - Kurniatan, Daniel

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Y1 - 2011/3/20

N2 - An Si/SiO2 multilayer with zigzag layer interfaces is fabricated on a patterned silica substrate using the autocloning method. The multilayer is designed to function as multichannel long-wave pass type edge filters with various cutoff wavelengths. A cutoff wavelength shift of the order of 190nm in the near infrared region (1300-1500 nm) is experimentally demonstrated.

AB - An Si/SiO2 multilayer with zigzag layer interfaces is fabricated on a patterned silica substrate using the autocloning method. The multilayer is designed to function as multichannel long-wave pass type edge filters with various cutoff wavelengths. A cutoff wavelength shift of the order of 190nm in the near infrared region (1300-1500 nm) is experimentally demonstrated.

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SP - C50-C54

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Design and fabrication of multichannel Si/SiO₂ autocloned photonic crystal edge filters

Abstract

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