Abstract
Oxygen in a polycrystalline diamond thin film grown by microwave-assisted chemical vapor deposition is evaluated by secondary ion mass spectrometry (SIMS). The depth profile of 16O measured as a function of the current density of a primary ion beam indicates a variation from a decrease in background intensity to an increase in oxygen intensity due to the signal from diamond. The oxygen concentration in a polycrystalline diamond thin film is 5 × 10-5 in 16O/13C. The method of analyzing the oxygen concentration in diamond is useful for developing diamond devices.
Original language | English |
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Pages (from-to) | 3391-3393 |
Number of pages | 3 |
Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
Volume | 46 |
Issue number | 6 A |
DOIs | |
Publication status | Published - 2007 Jun 6 |
Externally published | Yes |
Keywords
- Chemical vapor deposition
- Diamond
- Oxygen
- Secondary ion mass spectrometry
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)