Determination of absolute thickness and mean free path of thin foil specimen by ζ-factor method

Katsunori Ohshima, Kenji Kaneko, Takeshi Fujita, Zenji Horita

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


The ζ-factor method is applied to the thickness determination of thin amorphous specimens where the convergent-beam electron diffraction method is not applicable. Characteristic X-ray intensities are first measured using standard specimens in order to determine ζ-factors. These ζ-factors are then used to determine local thicknesses of an amorphous Si and an amorphous Al alloy. Electron energy-loss spectroscopy (EELS) spectra are acquired at the same positions as for the X-ray measurements. Thus, using the thicknesses measured from the ζ-factor method, the electron meanfree path is determined through the EELS log-ratio method. The mean free path is measured as a function of the collection semi-angle, β, and specimen thickness, and it is also compared with theoretical values. Furthermore, the mean free path of amorphous Si is compared with that of the crystalline Si.

Original languageEnglish
Pages (from-to)137-142
Number of pages6
JournalJournal of Electron Microscopy
Issue number2
Publication statusPublished - 2004 May 25


  • Amorphous
  • Characteristic X-rays
  • EDS
  • EELS
  • Mean free path
  • Thickness

ASJC Scopus subject areas

  • Instrumentation


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