Development of a Minimal multi-target helicon sputtering tool

Kazunori Takahashi, Taichi Saito, Hiroyuki Kawasaki, Hayato Chiba, Naoyo Yamamoto, Hisashi Mizuguchi, Michihiro Inoue, Shiro Hara

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A Minimal multi-target helicon sputtering tool is developed to deposit a multi-layer metallic film for electrodes and interconnection wires in the Minimal Fab System.

Original languageEnglish
Title of host publication2018 International Symposium on Semiconductor Manufacturing, ISSM 2018 - Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781538662687
DOIs
Publication statusPublished - 2018 Jul 2
Event2018 International Symposium on Semiconductor Manufacturing, ISSM 2018 - Tokyo, Japan
Duration: 2018 Dec 102018 Dec 11

Publication series

NameIEEE International Symposium on Semiconductor Manufacturing Conference Proceedings
Volume2018-December
ISSN (Print)1523-553X

Conference

Conference2018 International Symposium on Semiconductor Manufacturing, ISSM 2018
Country/TerritoryJapan
CityTokyo
Period18/12/1018/12/11

Fingerprint

Dive into the research topics of 'Development of a Minimal multi-target helicon sputtering tool'. Together they form a unique fingerprint.

Cite this