TY - GEN
T1 - Development of an objective flat-field spectrograph for electron microscopic soft x-ray emission spectrometry in 50-4000 eV
AU - Imazono, T.
AU - Koike, M.
AU - Kawachi, T.
AU - Hasegawa, N.
AU - Koeda, M.
AU - Nagano, T.
AU - Sasai, H.
AU - Oue, Y.
AU - Yonezawa, Z.
AU - Kuramoto, S.
AU - Terauchi, M.
AU - Takahashi, H.
AU - Handa, N.
AU - Murano, T.
PY - 2013
Y1 - 2013
N2 - We have developed an objective soft x-ray flat-field spectrograph installed in electron microscopes (EMs). The spectrograph has two attractive features. One is that it is designed to cover a wide energy range of 50-4000 eV by using four varied-line-spacing holographic gratings (VLSHGs) optimized for 50-200 eV, 155-350 eV, 300-2200 eV, and 2000-4000 eV. The gratings dedicated for the respective energy ranges can be accommodated in the single spectrograph. This advantage comes from that the positions of the source points and image planes are assumed as the common parameters in the design of all gratings. Therefore, it allows to easily change the energy range by only choosing an appropriate grating and its position. The other is the application of a newly invented W/B4C multilayer coating. It has been adopted to the grating for the 2000-4000 eV range to overcome the considerable decrease of the diffraction efficiency in the energy range above ∼2 keV. The novel coating makes it possible to enhance uniformly the diffraction efficiency at a constant incidence angle in the whole energy range.
AB - We have developed an objective soft x-ray flat-field spectrograph installed in electron microscopes (EMs). The spectrograph has two attractive features. One is that it is designed to cover a wide energy range of 50-4000 eV by using four varied-line-spacing holographic gratings (VLSHGs) optimized for 50-200 eV, 155-350 eV, 300-2200 eV, and 2000-4000 eV. The gratings dedicated for the respective energy ranges can be accommodated in the single spectrograph. This advantage comes from that the positions of the source points and image planes are assumed as the common parameters in the design of all gratings. Therefore, it allows to easily change the energy range by only choosing an appropriate grating and its position. The other is the application of a newly invented W/B4C multilayer coating. It has been adopted to the grating for the 2000-4000 eV range to overcome the considerable decrease of the diffraction efficiency in the energy range above ∼2 keV. The novel coating makes it possible to enhance uniformly the diffraction efficiency at a constant incidence angle in the whole energy range.
KW - Aspheric wavefront recording
KW - Electron microscope
KW - Flat-field spectrograph
KW - Multilayer grating
KW - Soft x-ray emission spectroscopy
KW - Varied-line-spacing holographic grating
UR - http://www.scopus.com/inward/record.url?scp=84888881385&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84888881385&partnerID=8YFLogxK
U2 - 10.1117/12.2024652
DO - 10.1117/12.2024652
M3 - Conference contribution
AN - SCOPUS:84888881385
SN - 9780819496980
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advances in X-Ray/EUV Optics and Components VIII
T2 - Advances in X-Ray/EUV Optics and Components VIII
Y2 - 26 August 2013 through 28 August 2013
ER -