Development of an ultrasonic system for super-precise measurement of zero-CTE temperature of EUVL-grade TiO2-SiO2 ultra-low-expansion glasses

Jun Ichi Kushibiki; Mototaka Arakawa; Yuji Ohashi; Toshio Sannomiya; Yuko Maruyama

doi:10.1117/12.846570

Development of an ultrasonic system for super-precise measurement of zero-CTE temperature of EUVL-grade TiO₂-SiO₂ ultra-low-expansion glasses

Jun Ichi Kushibiki, Mototaka Arakawa, Yuji Ohashi, Toshio Sannomiya, Yuko Maruyama

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

2 Citations (Scopus)

Abstract

This paper presents the development of a practical system for super-precise evaluation of zero-CTE temperatures T(zero- CTE) of TiO₂-SiO ₂ glasses for extreme ultraviolet lithography (EUVL) by measuring leaky surface-acoustic-wave (LSAW) velocity VLSAW with a line-focus-beam ultrasonic material characterization (LFB-UMC) system. This new system can evaluate T(zero-CTE) from 20 to 150°C on the surfaces of glass substrates for photomasks and optical mirrors located at different positions in EUVL systems. This system operates in a stabilized temperature measurement environment (e.g., 23.00°C). It was demonstrated at 225 MHz for homogenized TiO₂-SiO₂ glass specimens with different annealing temperatures and realized an extremely homogeneous glass ingot with a ΔT(zero-CTE) of 1.6°C around 23.2°C. This ultrasonic system enables both glass manufacturers and users to speedily inspect all glass substrates with reliable data of T(zero-CTE).

Original language	English
Title of host publication	Extreme Ultraviolet (EUV) Lithography
DOIs	https://doi.org/10.1117/12.846570
Publication status	Published - 2010 Jun 17
Event	Extreme Ultraviolet (EUV) Lithography - San Jose, CA, United States Duration: 2010 Feb 22 → 2010 Feb 25

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	7636
ISSN (Print)	0277-786X

Other

Other	Extreme Ultraviolet (EUV) Lithography
Country/Territory	United States
City	San Jose, CA
Period	10/2/22 → 10/2/25

Keywords

TiO-SiO ultra-low-expansion glass
coefficient of thermal expansion
leaky surface acoustic waves
line-focus-beam ultrasonic material characterization system
velocity measurement

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.846570

Cite this

Kushibiki, J. I., Arakawa, M., Ohashi, Y., Sannomiya, T., & Maruyama, Y. (2010). Development of an ultrasonic system for super-precise measurement of zero-CTE temperature of EUVL-grade TiO₂-SiO₂ ultra-low-expansion glasses. In Extreme Ultraviolet (EUV) Lithography [76362M] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7636). https://doi.org/10.1117/12.846570

Development of an ultrasonic system for super-precise measurement of zero-CTE temperature of EUVL-grade TiO₂-SiO₂ ultra-low-expansion glasses. / Kushibiki, Jun Ichi; Arakawa, Mototaka ; Ohashi, Yuji et al.
Extreme Ultraviolet (EUV) Lithography. 2010. 76362M (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7636).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Kushibiki, JI, Arakawa, M , Ohashi, Y, Sannomiya, T & Maruyama, Y 2010, Development of an ultrasonic system for super-precise measurement of zero-CTE temperature of EUVL-grade TiO₂-SiO₂ ultra-low-expansion glasses. in Extreme Ultraviolet (EUV) Lithography., 76362M, Proceedings of SPIE - The International Society for Optical Engineering, vol. 7636, Extreme Ultraviolet (EUV) Lithography, San Jose, CA, United States, 10/2/22. https://doi.org/10.1117/12.846570

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abstract = "This paper presents the development of a practical system for super-precise evaluation of zero-CTE temperatures T(zero- CTE) of TiO2-SiO 2 glasses for extreme ultraviolet lithography (EUVL) by measuring leaky surface-acoustic-wave (LSAW) velocity VLSAW with a line-focus-beam ultrasonic material characterization (LFB-UMC) system. This new system can evaluate T(zero-CTE) from 20 to 150°C on the surfaces of glass substrates for photomasks and optical mirrors located at different positions in EUVL systems. This system operates in a stabilized temperature measurement environment (e.g., 23.00°C). It was demonstrated at 225 MHz for homogenized TiO2-SiO2 glass specimens with different annealing temperatures and realized an extremely homogeneous glass ingot with a ΔT(zero-CTE) of 1.6°C around 23.2°C. This ultrasonic system enables both glass manufacturers and users to speedily inspect all glass substrates with reliable data of T(zero-CTE).",

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