TY - JOUR
T1 - Development of giant negative thermal-expansion materials utilizing pressure-induced phase transitions
AU - Azuma, Masaki
AU - Sakai, Yuki
AU - Nishikubo, Takumi
AU - Oka, Kengo
AU - Yamamoto, Hajime
N1 - Publisher Copyright:
© 2020, Japan Society of High Pressure Science and Technology. All rights reserved.
PY - 2020
Y1 - 2020
N2 - Negative thermal expansion (NTE) materials are expected to be utilized for control of the thermal expansion of structure materials in the fields of semiconductor manufacturing, optical devices and precise machining where precise positioning is required. In this review, giant NTEs in Pb1－xBixVO3 induced by ferroelectric-paraelectric transition and in BiNi1－xFexO3 induced by intermetallic charge transfer will be discussed. [negative thermal expansion, pressure induced phase transition, ferroelectric transition, charge transfer].
AB - Negative thermal expansion (NTE) materials are expected to be utilized for control of the thermal expansion of structure materials in the fields of semiconductor manufacturing, optical devices and precise machining where precise positioning is required. In this review, giant NTEs in Pb1－xBixVO3 induced by ferroelectric-paraelectric transition and in BiNi1－xFexO3 induced by intermetallic charge transfer will be discussed. [negative thermal expansion, pressure induced phase transition, ferroelectric transition, charge transfer].
UR - http://www.scopus.com/inward/record.url?scp=85100301874&partnerID=8YFLogxK
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U2 - 10.4131/jshpreview.30.187
DO - 10.4131/jshpreview.30.187
M3 - Article
AN - SCOPUS:85100301874
SN - 0917-639X
VL - 30
SP - 187
EP - 194
JO - Review of High Pressure Science and Technology/Koatsuryoku No Kagaku To Gijutsu
JF - Review of High Pressure Science and Technology/Koatsuryoku No Kagaku To Gijutsu
IS - 3
ER -