Development of high-accuracy X-ray ptychography apparatus

Akihiro Suzuki, Yasunori Senba, Haruhiko Ohashi, Yoshiki Kohmura, Kazuto Yamauchi, Tetsuya Ishikawa, Yukio Takahashi

Research output: Contribution to journalConference articlepeer-review


X-ray ptychography allows us to observe the internal structures of non-isolated objects without lenses. We developed a high-accuracy X-ray ptychography apparatus equipped with Kirkpatrick-Baez mirrors. The full width at half-maximum of the focal profiles was ∼600 nm for the vertical and horizontal directions. The estimated flux was ∼3×107 photons/s. We also developed a constant-temperature system to suppress sample and/or beam drift during measurements. The temperature change of the apparatus was controlled to less than 0.04 °C over 10 hours. The total amount of drift over 10 hours was suppressed to less than 500 nm. By using both the constant-temperature system and a drift compensation method, the reconstructed image of the test object was markedly improved.

Original languageEnglish
Article number012039
JournalJournal of Physics: Conference Series
Issue number1
Publication statusPublished - 2013
Event11th International Conference on X-Ray Microscopy, XRM 2012 - Shanghai, China
Duration: 2012 Aug 52012 Aug 10


Dive into the research topics of 'Development of high-accuracy X-ray ptychography apparatus'. Together they form a unique fingerprint.

Cite this