Development of UV-curable resins suitable for reverse-Tone lithography for au metamaterials using a print-And-imprint method

Takuya Uehara; Shinya Sato; Shunya Ito; Haruna Yano; Takahiro Nakamura; Masaru Nakagawa

doi:10.1246/bcsj.20170280

Development of UV-curable resins suitable for reverse-Tone lithography for au metamaterials using a print-And-imprint method

Takuya Uehara, Shinya Sato, Shunya Ito, Haruna Yano, Takahiro Nakamura, Masaru Nakagawa

IMRAM - Materials-Measurement Hybrid Research Center

Tohoku University

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

We developed a UV-curable resin (NL-SU1) suitable for screen printing with laser-drilled polyimide masks and reversetone nanoimprint lithography. The viscosity of the UV-curable resin composed of two bisphenol A-based monomers was adjusted to 11.0 Pas for the screen printing process. It was determined by photo-differential scanning calorimetry that photoinitiator Irgacure 369 was suitable for high methacrylate consumption in UV curing. The UV-curable resin after curing could be used as a top-coated resist layer on another imprinted resist layer because of its sufficient contrast in oxygen reactive ion etching and argon ion milling. We demonstrated a method for reverse-Tone lithography in a printand- imprint method to fabricate 20-nm-Thick and 50-nm-linewide Au split-ring resonator arrays.

Original language	English
Pages (from-to)	178-186
Number of pages	9
Journal	Bulletin of the Chemical Society of Japan
Volume	91
Issue number	2
DOIs	https://doi.org/10.1246/bcsj.20170280
Publication status	Published - 2018

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title = "Development of UV-curable resins suitable for reverse-Tone lithography for au metamaterials using a print-And-imprint method",

abstract = "We developed a UV-curable resin (NL-SU1) suitable for screen printing with laser-drilled polyimide masks and reversetone nanoimprint lithography. The viscosity of the UV-curable resin composed of two bisphenol A-based monomers was adjusted to 11.0 Pas for the screen printing process. It was determined by photo-differential scanning calorimetry that photoinitiator Irgacure 369 was suitable for high methacrylate consumption in UV curing. The UV-curable resin after curing could be used as a top-coated resist layer on another imprinted resist layer because of its sufficient contrast in oxygen reactive ion etching and argon ion milling. We demonstrated a method for reverse-Tone lithography in a printand- imprint method to fabricate 20-nm-Thick and 50-nm-linewide Au split-ring resonator arrays.",

author = "Takuya Uehara and Shinya Sato and Shunya Ito and Haruna Yano and Takahiro Nakamura and Masaru Nakagawa",

note = "Funding Information: This work was supported by KAKENHI (15H03860) for M. Nakagawa, JSPS KAKENHI (16J05484) for S. Ito, and JSPS KAKENHI (15J05451) for T. Uehara, and the Research Program of “Dynamic Alliance for Open Innovation Bridging Human, Environment and Materials” in “Network Joint Research Center for Materials and Devices”. Publisher Copyright: {\textcopyright} 2018 The Chemical Society of Japan.",

year = "2018",

doi = "10.1246/bcsj.20170280",

language = "English",

volume = "91",

pages = "178--186",

journal = "Bulletin of the Chemical Society of Japan",

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publisher = "The Chemical Society of Japan",

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T1 - Development of UV-curable resins suitable for reverse-Tone lithography for au metamaterials using a print-And-imprint method

AU - Uehara, Takuya

AU - Sato, Shinya

AU - Ito, Shunya

AU - Yano, Haruna

AU - Nakamura, Takahiro

AU - Nakagawa, Masaru

N1 - Funding Information: This work was supported by KAKENHI (15H03860) for M. Nakagawa, JSPS KAKENHI (16J05484) for S. Ito, and JSPS KAKENHI (15J05451) for T. Uehara, and the Research Program of “Dynamic Alliance for Open Innovation Bridging Human, Environment and Materials” in “Network Joint Research Center for Materials and Devices”. Publisher Copyright: © 2018 The Chemical Society of Japan.

PY - 2018

Y1 - 2018

N2 - We developed a UV-curable resin (NL-SU1) suitable for screen printing with laser-drilled polyimide masks and reversetone nanoimprint lithography. The viscosity of the UV-curable resin composed of two bisphenol A-based monomers was adjusted to 11.0 Pas for the screen printing process. It was determined by photo-differential scanning calorimetry that photoinitiator Irgacure 369 was suitable for high methacrylate consumption in UV curing. The UV-curable resin after curing could be used as a top-coated resist layer on another imprinted resist layer because of its sufficient contrast in oxygen reactive ion etching and argon ion milling. We demonstrated a method for reverse-Tone lithography in a printand- imprint method to fabricate 20-nm-Thick and 50-nm-linewide Au split-ring resonator arrays.

AB - We developed a UV-curable resin (NL-SU1) suitable for screen printing with laser-drilled polyimide masks and reversetone nanoimprint lithography. The viscosity of the UV-curable resin composed of two bisphenol A-based monomers was adjusted to 11.0 Pas for the screen printing process. It was determined by photo-differential scanning calorimetry that photoinitiator Irgacure 369 was suitable for high methacrylate consumption in UV curing. The UV-curable resin after curing could be used as a top-coated resist layer on another imprinted resist layer because of its sufficient contrast in oxygen reactive ion etching and argon ion milling. We demonstrated a method for reverse-Tone lithography in a printand- imprint method to fabricate 20-nm-Thick and 50-nm-linewide Au split-ring resonator arrays.

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Development of UV-curable resins suitable for reverse-Tone lithography for au metamaterials using a print-And-imprint method

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