Abstract
Diffusion of gallium in single-crystal ZnO (implanted at 150keV at a dose of 2 × 1016 cm-2) in the temperature range between 800 and 900°C was investigated on the basis of experimentally measured and simulated profiles. The gallium concentration profiles have a characteristic tail with a constant-concentration region owing to the Fermi-level effect on the diffusion. The gallium concentration profiles were compared with the simulated profiles: both profiles are in good agreement. The simulation provides possible models for gallium diffusion based on the interstitialcy or vacancy mechanism.
Original language | English |
---|---|
Pages (from-to) | 4099-4101 |
Number of pages | 3 |
Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
Volume | 46 |
Issue number | 7 A |
DOIs | |
Publication status | Published - 2007 Jul 4 |
Externally published | Yes |
Keywords
- Diffusion
- Fermi-level effect
- Gallium
- Ion implantation
- SIMS
- ZnO
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)