Diffusion model of gallium in single-crystal zno proposed from analysis of concentration-dependent profiles based on the fermi-level effect

Tsubasa Nakagawa, Isao Sakaguchi, Masashi Uematsu, Yoshiyuki Sato, Naoki Ohashi, Hajime Haneda, Yuichi Ikuhara

Research output: Contribution to journalArticlepeer-review

23 Citations (Scopus)

Abstract

Diffusion of gallium in single-crystal ZnO (implanted at 150keV at a dose of 2 × 1016 cm-2) in the temperature range between 800 and 900°C was investigated on the basis of experimentally measured and simulated profiles. The gallium concentration profiles have a characteristic tail with a constant-concentration region owing to the Fermi-level effect on the diffusion. The gallium concentration profiles were compared with the simulated profiles: both profiles are in good agreement. The simulation provides possible models for gallium diffusion based on the interstitialcy or vacancy mechanism.

Original languageEnglish
Pages (from-to)4099-4101
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume46
Issue number7 A
DOIs
Publication statusPublished - 2007 Jul 4
Externally publishedYes

Keywords

  • Diffusion
  • Fermi-level effect
  • Gallium
  • Ion implantation
  • SIMS
  • ZnO

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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