TY - GEN
T1 - DIRECT WRITING OF HIGHLY CONDUCTIVE Mo LINES BY LASER INDUCED CVD.
AU - Uesugi, Fumihiko
AU - Yokoyama, Hiroyuki
AU - Kishida, Shunji
PY - 1985
Y1 - 1985
N2 - Direct writing of highly conductive Mo lines has been achieved by laser induced photothermal CVD from Mo(CO)//6. The resistivity of deposited Mo lines was as small as 40 mu OMEGA -cm. CVD characteristics have been examined in detail under different CVD conditions. From comparison with photochemical CVD, photothermal CVD superiority for obtaining metallic and highly conductive Mo lines has been clarified.
AB - Direct writing of highly conductive Mo lines has been achieved by laser induced photothermal CVD from Mo(CO)//6. The resistivity of deposited Mo lines was as small as 40 mu OMEGA -cm. CVD characteristics have been examined in detail under different CVD conditions. From comparison with photochemical CVD, photothermal CVD superiority for obtaining metallic and highly conductive Mo lines has been clarified.
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UR - http://www.scopus.com/inward/citedby.url?scp=0022189150&partnerID=8YFLogxK
U2 - 10.7567/ssdm.1985.a-3-9
DO - 10.7567/ssdm.1985.a-3-9
M3 - Conference contribution
AN - SCOPUS:0022189150
SN - 4930813107
SN - 9784930813107
T3 - Conference on Solid State Devices and Materials
SP - 193
EP - 196
BT - Conference on Solid State Devices and Materials
PB - Japan Soc of Applied Physics
ER -