Effect of annealing on the tolerance of LiCaAlF6 single crystals against F2 laser irradiation

Yoshizo Kawaguchi; Aiko Narazaki; Tadatake Sato; Ryozo Kurosaki; Hiroyuki Niino; Hiroki Sato; Tsuguo Fukuda

doi:10.1143/JJAP.43.6168

Effect of annealing on the tolerance of LiCaAlF₆ single crystals against F₂ laser irradiation

Yoshizo Kawaguchi, Aiko Narazaki, Tadatake Sato, Ryozo Kurosaki, Hiroyuki Niino, Hiroki Sato, Tsuguo Fukuda

New Industry Creation Hatchery Center (NICHe)

Research output: Contribution to journal › Article › peer-review

Abstract

The optical tolerance of annealed LiCaAlF₆ single crystals against F₂ laser irradiation was investigated. Annealed LiCaAlF ₆ (t = 1.45 mm) shows an improved transmittance at 157 nm, 94.4% after the compensation of the surface reflection loss. Furthermore, after the initial increase by F₂ laser cleaning, transmittance at 157 nm remains almost unchanged even after irradiation with a F₂ laser beam up to 10⁵ pulses at a fluence of approximately 160 mJ cm^-2 pulse^-1.

Original language	English
Pages (from-to)	6168-6169
Number of pages	2
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	43
Issue number	9 A
DOIs	https://doi.org/10.1143/JJAP.43.6168
Publication status	Published - 2004 Sept

Keywords

Annealing
F laser
LiCaAlF
Optical tolerance
Transmittance
Vacuum ultraviolet light

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

Access to Document

10.1143/JJAP.43.6168

Cite this

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title = "Effect of annealing on the tolerance of LiCaAlF6 single crystals against F2 laser irradiation",

abstract = "The optical tolerance of annealed LiCaAlF6 single crystals against F2 laser irradiation was investigated. Annealed LiCaAlF 6 (t = 1.45 mm) shows an improved transmittance at 157 nm, 94.4% after the compensation of the surface reflection loss. Furthermore, after the initial increase by F2 laser cleaning, transmittance at 157 nm remains almost unchanged even after irradiation with a F2 laser beam up to 105 pulses at a fluence of approximately 160 mJ cm-2 pulse-1.",

keywords = "Annealing, F laser, LiCaAlF, Optical tolerance, Transmittance, Vacuum ultraviolet light",

author = "Yoshizo Kawaguchi and Aiko Narazaki and Tadatake Sato and Ryozo Kurosaki and Hiroyuki Niino and Hiroki Sato and Tsuguo Fukuda",

year = "2004",

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T1 - Effect of annealing on the tolerance of LiCaAlF6 single crystals against F2 laser irradiation

AU - Kawaguchi, Yoshizo

AU - Narazaki, Aiko

AU - Sato, Tadatake

AU - Kurosaki, Ryozo

AU - Niino, Hiroyuki

AU - Sato, Hiroki

AU - Fukuda, Tsuguo

PY - 2004/9

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N2 - The optical tolerance of annealed LiCaAlF6 single crystals against F2 laser irradiation was investigated. Annealed LiCaAlF 6 (t = 1.45 mm) shows an improved transmittance at 157 nm, 94.4% after the compensation of the surface reflection loss. Furthermore, after the initial increase by F2 laser cleaning, transmittance at 157 nm remains almost unchanged even after irradiation with a F2 laser beam up to 105 pulses at a fluence of approximately 160 mJ cm-2 pulse-1.

AB - The optical tolerance of annealed LiCaAlF6 single crystals against F2 laser irradiation was investigated. Annealed LiCaAlF 6 (t = 1.45 mm) shows an improved transmittance at 157 nm, 94.4% after the compensation of the surface reflection loss. Furthermore, after the initial increase by F2 laser cleaning, transmittance at 157 nm remains almost unchanged even after irradiation with a F2 laser beam up to 105 pulses at a fluence of approximately 160 mJ cm-2 pulse-1.

KW - Annealing

KW - F laser

KW - LiCaAlF

KW - Optical tolerance

KW - Transmittance

KW - Vacuum ultraviolet light

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