The Nd-Fe-B (tNFB = 30 nm)/[Dy (tDy nm)/Nd (t Nd nm)] (tDy/Nd = 20 nm) (thickness tDy = 0-10 nm) thin films were deposited on Al2O3(0001) substrate and subsequently in-situ annealed at 470 °C. As-deposited Nd-Fe-B thin films with a highly perpendicular orientation of c-axis were deposited by introducing bcc-Mo(111) single crystal buffer layer. After post-annealing, the grain size of the Nd-Fe-B/Dy/Nd thin films with the tDy = 10 nm and tNd = 10 nm becomes large due to the Dy and the Nd atoms thermal diffusion, while DyFe2 and Dy oxide compounds are formed in Nd-Fe-B layers, which is confirmed by means of a combination of atomic force microscopy observation and X-ray diffraction measurement. The Hc of Nd-Fe-B/Dy/Nd thin films with the tDy = 10 nm and tNd = 10 nm was approximately the same value of the Nd-Fe-B thin films without Dy/Nd double layer annealed at 470 °C. On the other hand, Hc is enhanced to be about 22.1 kOe in the annealed Nd-Fe-B/Dy/Nd films with the tDy = 0.8 nm and t Nd = 19.2 nm.
|Journal||Journal of Applied Physics|
|Publication status||Published - 2014 May 7|
ASJC Scopus subject areas
- Physics and Astronomy(all)