Effect of laser wavelength on phase and microstructure of TiO2 films prepared by laser chemical vapor deposition

Ming Gao; Akihiko Ito; Takashi Goto

doi:10.1016/j.surfcoat.2014.02.003

Effect of laser wavelength on phase and microstructure of TiO₂ films prepared by laser chemical vapor deposition

Ming Gao, Akihiko Ito, Takashi Goto

Materials Processing and Characterization Division

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

Rutile and anatase TiO₂ films were prepared by laser chemical vapor deposition using CO₂ and Nd:YAG lasers. The effects of laser wavelength on the phase, orientation, and microstructure of these TiO₂ films were investigated. Using a CO₂ laser, single-phase rutile TiO₂ films were obtained at 826-1225K. These films showed a (100) orientation and a dense structure. The highest deposition rate was 83μmh^-1 at 1070K. Using a Nd:YAG laser, the phase of the TiO₂ films changed from rutile to anatase with increasing deposition temperature from 852 to 1230K. The rutile TiO₂ films showed a (100) orientation with a columnar structure, while the anatase TiO₂ films exhibited a (001) orientation with a cauliflower-like structure. Using a Nd:YAG laser, the highest deposition rates for rutile and anatase TiO₂ films were 142 and 40μmh^-1, respectively.

Original language	English
Pages (from-to)	166-172
Number of pages	7
Journal	Surface and Coatings Technology
Volume	244
DOIs	https://doi.org/10.1016/j.surfcoat.2014.02.003
Publication status	Published - 2014 Apr 15

Keywords

Anatase
Laser CVD
Rutile
Thick film

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

Access to Document

10.1016/j.surfcoat.2014.02.003

Cite this

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title = "Effect of laser wavelength on phase and microstructure of TiO2 films prepared by laser chemical vapor deposition",

abstract = "Rutile and anatase TiO2 films were prepared by laser chemical vapor deposition using CO2 and Nd:YAG lasers. The effects of laser wavelength on the phase, orientation, and microstructure of these TiO2 films were investigated. Using a CO2 laser, single-phase rutile TiO2 films were obtained at 826-1225K. These films showed a (100) orientation and a dense structure. The highest deposition rate was 83μmh-1 at 1070K. Using a Nd:YAG laser, the phase of the TiO2 films changed from rutile to anatase with increasing deposition temperature from 852 to 1230K. The rutile TiO2 films showed a (100) orientation with a columnar structure, while the anatase TiO2 films exhibited a (001) orientation with a cauliflower-like structure. Using a Nd:YAG laser, the highest deposition rates for rutile and anatase TiO2 films were 142 and 40μmh-1, respectively.",

keywords = "Anatase, Laser CVD, Rutile, Thick film",

author = "Ming Gao and Akihiko Ito and Takashi Goto",

note = "Funding Information: This research was supported in part by the Global COE Program of Materials Integration, Tohoku University , and in part by the Japan Society for the Promotion of Science, Grant-in-Aid for Young Scientists (A) , 25709069 . This research was also supported in part by the 111 project, China ( B13035 ).",

year = "2014",

month = apr,

day = "15",

doi = "10.1016/j.surfcoat.2014.02.003",

language = "English",

volume = "244",

pages = "166--172",

journal = "Surface and Coatings Technology",

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TY - JOUR

T1 - Effect of laser wavelength on phase and microstructure of TiO2 films prepared by laser chemical vapor deposition

AU - Gao, Ming

AU - Ito, Akihiko

AU - Goto, Takashi

N1 - Funding Information: This research was supported in part by the Global COE Program of Materials Integration, Tohoku University , and in part by the Japan Society for the Promotion of Science, Grant-in-Aid for Young Scientists (A) , 25709069 . This research was also supported in part by the 111 project, China ( B13035 ).

PY - 2014/4/15

Y1 - 2014/4/15

N2 - Rutile and anatase TiO2 films were prepared by laser chemical vapor deposition using CO2 and Nd:YAG lasers. The effects of laser wavelength on the phase, orientation, and microstructure of these TiO2 films were investigated. Using a CO2 laser, single-phase rutile TiO2 films were obtained at 826-1225K. These films showed a (100) orientation and a dense structure. The highest deposition rate was 83μmh-1 at 1070K. Using a Nd:YAG laser, the phase of the TiO2 films changed from rutile to anatase with increasing deposition temperature from 852 to 1230K. The rutile TiO2 films showed a (100) orientation with a columnar structure, while the anatase TiO2 films exhibited a (001) orientation with a cauliflower-like structure. Using a Nd:YAG laser, the highest deposition rates for rutile and anatase TiO2 films were 142 and 40μmh-1, respectively.

AB - Rutile and anatase TiO2 films were prepared by laser chemical vapor deposition using CO2 and Nd:YAG lasers. The effects of laser wavelength on the phase, orientation, and microstructure of these TiO2 films were investigated. Using a CO2 laser, single-phase rutile TiO2 films were obtained at 826-1225K. These films showed a (100) orientation and a dense structure. The highest deposition rate was 83μmh-1 at 1070K. Using a Nd:YAG laser, the phase of the TiO2 films changed from rutile to anatase with increasing deposition temperature from 852 to 1230K. The rutile TiO2 films showed a (100) orientation with a columnar structure, while the anatase TiO2 films exhibited a (001) orientation with a cauliflower-like structure. Using a Nd:YAG laser, the highest deposition rates for rutile and anatase TiO2 films were 142 and 40μmh-1, respectively.

KW - Anatase

KW - Laser CVD

KW - Rutile

KW - Thick film

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