Effect of microbubbles on ozonized water for photoresist removal

Masayoshi Takahashi; Hideo Horibe; Kouhei Matsuura; Katsumi Tatera

doi:10.2494/photopolymer.28.293

Effect of microbubbles on ozonized water for photoresist removal

Masayoshi Takahashi, Hideo Horibe, Kouhei Matsuura, Katsumi Tatera

Research output: Contribution to journal › Article › peer-review

18 Citations (Scopus)

Abstract

The existence of microbubbles in ozonized water has been shown to significantly enhance the photoresist removal rate due to an elevated dissolved ozone concentration and a direct effect of the microbubbles relating to the radical generation. Additionally, the ozone microbubble solution was able to effectively remove a high-dose ion-implanted photoresist, which is extremely resistant to removal by ozonized water and other wet chemicals because of its amorphous carbon-like layer, or “crust”. Electron spin resonance experiments were also performed without the influence of serious metal contamination and indicated the presence of hydroxyl radicals, which are thought to be formed by interaction of ozone with hydroxide ions adsorbed at the gas-water interface upon collapse of the microbubbles.

Original language	English
Pages (from-to)	293-298
Number of pages	6
Journal	Journal of Photopolymer Science and Technology
Volume	28
Issue number	2
DOIs	https://doi.org/10.2494/photopolymer.28.293
Publication status	Published - 2015 Aug 19
Externally published	Yes

Keywords

Hydroxyl radicals
Ozone microbubbles
Photoresist removal

ASJC Scopus subject areas

Polymers and Plastics
Organic Chemistry
Materials Chemistry

Access to Document

10.2494/photopolymer.28.293

Cite this

@article{ee4424fce04d4f1c91d2d1d019ab437f,

title = "Effect of microbubbles on ozonized water for photoresist removal",

abstract = "The existence of microbubbles in ozonized water has been shown to significantly enhance the photoresist removal rate due to an elevated dissolved ozone concentration and a direct effect of the microbubbles relating to the radical generation. Additionally, the ozone microbubble solution was able to effectively remove a high-dose ion-implanted photoresist, which is extremely resistant to removal by ozonized water and other wet chemicals because of its amorphous carbon-like layer, or “crust”. Electron spin resonance experiments were also performed without the influence of serious metal contamination and indicated the presence of hydroxyl radicals, which are thought to be formed by interaction of ozone with hydroxide ions adsorbed at the gas-water interface upon collapse of the microbubbles.",

keywords = "Hydroxyl radicals, Ozone microbubbles, Photoresist removal",

author = "Masayoshi Takahashi and Hideo Horibe and Kouhei Matsuura and Katsumi Tatera",

note = "Publisher Copyright: {\textcopyright} 2015SPST.",

year = "2015",

month = aug,

day = "19",

doi = "10.2494/photopolymer.28.293",

language = "English",

volume = "28",

pages = "293--298",

journal = "Journal of Photopolymer Science and Technology",

issn = "0914-9244",

publisher = "Tokai University",

number = "2",

}

TY - JOUR

T1 - Effect of microbubbles on ozonized water for photoresist removal

AU - Takahashi, Masayoshi

AU - Horibe, Hideo

AU - Matsuura, Kouhei

AU - Tatera, Katsumi

PY - 2015/8/19

Y1 - 2015/8/19

N2 - The existence of microbubbles in ozonized water has been shown to significantly enhance the photoresist removal rate due to an elevated dissolved ozone concentration and a direct effect of the microbubbles relating to the radical generation. Additionally, the ozone microbubble solution was able to effectively remove a high-dose ion-implanted photoresist, which is extremely resistant to removal by ozonized water and other wet chemicals because of its amorphous carbon-like layer, or “crust”. Electron spin resonance experiments were also performed without the influence of serious metal contamination and indicated the presence of hydroxyl radicals, which are thought to be formed by interaction of ozone with hydroxide ions adsorbed at the gas-water interface upon collapse of the microbubbles.

AB - The existence of microbubbles in ozonized water has been shown to significantly enhance the photoresist removal rate due to an elevated dissolved ozone concentration and a direct effect of the microbubbles relating to the radical generation. Additionally, the ozone microbubble solution was able to effectively remove a high-dose ion-implanted photoresist, which is extremely resistant to removal by ozonized water and other wet chemicals because of its amorphous carbon-like layer, or “crust”. Electron spin resonance experiments were also performed without the influence of serious metal contamination and indicated the presence of hydroxyl radicals, which are thought to be formed by interaction of ozone with hydroxide ions adsorbed at the gas-water interface upon collapse of the microbubbles.

KW - Hydroxyl radicals

KW - Ozone microbubbles

KW - Photoresist removal

UR - http://www.scopus.com/inward/record.url?scp=84939509186&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84939509186&partnerID=8YFLogxK

U2 - 10.2494/photopolymer.28.293

DO - 10.2494/photopolymer.28.293

M3 - Article

AN - SCOPUS:84939509186

SN - 0914-9244

VL - 28

SP - 293

EP - 298

JO - Journal of Photopolymer Science and Technology

JF - Journal of Photopolymer Science and Technology

IS - 2

ER -

Effect of microbubbles on ozonized water for photoresist removal

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this