Effect of Na4O7P2 on Cu powder preparation from Cu2O-water slurry system

J. G. Ahn; T. H. Hoang; D. J. Kim; M. S. Kim; C. O. Kim; H. S. Chung

doi:10.1016/j.jcis.2007.08.070

Effect of Na₄O₇P₂ on Cu powder preparation from Cu₂O-water slurry system

J. G. Ahn, T. H. Hoang, D. J. Kim, M. S. Kim, C. O. Kim, H. S. Chung

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

A unique approach is presented for preparing highly dispersed ultrafine copper particles from cuprous oxide slurry using a wet chemical reaction with hydrazine (N₂H₄) as a reductant along with an appropriate addition of sodium pyrophosphate (Na₄O₇P₂) as a surfactant. It was found that very thin oxidized surfaces on the copper particles are formed during the reaction in the solution and subsequently sodium pyrophosphate plays an important role in the zeta potential of the particles, affecting their dispersion and growth significantly. The copper particles at low zeta potential easily aggregate and grow to bigger ones, whereas they at high zeta potential keep away each other and grew individually to ultrafine size. Additionally, a model for the copper particles growth in accordance with dispersion is proposed.

Original language	English
Pages (from-to)	109-114
Number of pages	6
Journal	Journal of Colloid And Interface Science
Volume	319
Issue number	1
DOIs	https://doi.org/10.1016/j.jcis.2007.08.070
Publication status	Published - 2008 Mar 1
Externally published	Yes

Keywords

Dispersion
Slurry
Sodium pyrophosphate
Ultrafine copper powders
Zeta potential

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Biomaterials
Surfaces, Coatings and Films
Colloid and Surface Chemistry

Access to Document

10.1016/j.jcis.2007.08.070

Cite this

@article{7e460ccfe13a40629af21395afa9b456,

title = "Effect of Na4O7P2 on Cu powder preparation from Cu2O-water slurry system",

abstract = "A unique approach is presented for preparing highly dispersed ultrafine copper particles from cuprous oxide slurry using a wet chemical reaction with hydrazine (N2H4) as a reductant along with an appropriate addition of sodium pyrophosphate (Na4O7P2) as a surfactant. It was found that very thin oxidized surfaces on the copper particles are formed during the reaction in the solution and subsequently sodium pyrophosphate plays an important role in the zeta potential of the particles, affecting their dispersion and growth significantly. The copper particles at low zeta potential easily aggregate and grow to bigger ones, whereas they at high zeta potential keep away each other and grew individually to ultrafine size. Additionally, a model for the copper particles growth in accordance with dispersion is proposed.",

keywords = "Dispersion, Slurry, Sodium pyrophosphate, Ultrafine copper powders, Zeta potential",

author = "Ahn, {J. G.} and Hoang, {T. H.} and Kim, {D. J.} and Kim, {M. S.} and Kim, {C. O.} and Chung, {H. S.}",

note = "Funding Information: The research was performed with a grant from the Ministry of Science and Technology (MOST) of Korea. The authors wish to thank MOST for the financial support.",

year = "2008",

month = mar,

day = "1",

doi = "10.1016/j.jcis.2007.08.070",

language = "English",

volume = "319",

pages = "109--114",

journal = "Journal of Colloid and Interface Science",

issn = "0021-9797",

publisher = "Academic Press Inc.",

number = "1",

}

TY - JOUR

T1 - Effect of Na4O7P2 on Cu powder preparation from Cu2O-water slurry system

AU - Ahn, J. G.

AU - Hoang, T. H.

AU - Kim, D. J.

AU - Kim, M. S.

AU - Kim, C. O.

AU - Chung, H. S.

N1 - Funding Information: The research was performed with a grant from the Ministry of Science and Technology (MOST) of Korea. The authors wish to thank MOST for the financial support.

PY - 2008/3/1

Y1 - 2008/3/1

N2 - A unique approach is presented for preparing highly dispersed ultrafine copper particles from cuprous oxide slurry using a wet chemical reaction with hydrazine (N2H4) as a reductant along with an appropriate addition of sodium pyrophosphate (Na4O7P2) as a surfactant. It was found that very thin oxidized surfaces on the copper particles are formed during the reaction in the solution and subsequently sodium pyrophosphate plays an important role in the zeta potential of the particles, affecting their dispersion and growth significantly. The copper particles at low zeta potential easily aggregate and grow to bigger ones, whereas they at high zeta potential keep away each other and grew individually to ultrafine size. Additionally, a model for the copper particles growth in accordance with dispersion is proposed.

AB - A unique approach is presented for preparing highly dispersed ultrafine copper particles from cuprous oxide slurry using a wet chemical reaction with hydrazine (N2H4) as a reductant along with an appropriate addition of sodium pyrophosphate (Na4O7P2) as a surfactant. It was found that very thin oxidized surfaces on the copper particles are formed during the reaction in the solution and subsequently sodium pyrophosphate plays an important role in the zeta potential of the particles, affecting their dispersion and growth significantly. The copper particles at low zeta potential easily aggregate and grow to bigger ones, whereas they at high zeta potential keep away each other and grew individually to ultrafine size. Additionally, a model for the copper particles growth in accordance with dispersion is proposed.

KW - Dispersion

KW - Slurry

KW - Sodium pyrophosphate

KW - Ultrafine copper powders

KW - Zeta potential

UR - http://www.scopus.com/inward/record.url?scp=37849043360&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=37849043360&partnerID=8YFLogxK

U2 - 10.1016/j.jcis.2007.08.070

DO - 10.1016/j.jcis.2007.08.070

M3 - Article

C2 - 18083177

AN - SCOPUS:37849043360

SN - 0021-9797

VL - 319

SP - 109

EP - 114

JO - Journal of Colloid and Interface Science

JF - Journal of Colloid and Interface Science

IS - 1

ER -