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Effect of silicon wafer in situ cleaning on the chemical structure of ultrathin silicon oxide film
Naozumi Terada, Hiroki Ogawa, Kazunori Moriki, Akinobu Teramoto, Koji Makihara, Mizuho Morita, Tadahiro Ohmi, Takeo Hattori
Research output: Contribution to journal › Article › peer-review
14
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(Scopus)