Effect of SiO2 fence on atomic step flow in chemical etching of Si surface

Daisuke Hojo, Norio Tokuda, Kikuo Yamabe

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12 Citations (Scopus)


A method of realizing Si surfaces without step lines in predetermined areas surrounded by SiO2 fences was investigated. The SiO2 fence blocked the atomic step flow during chemical etching of the Si surface. Atomic step flow in the downside of the SiO2 fences stopped at the SiO2 fences, while atomic step flow in the upside of the SiO2 fences during the chemical etching of the Si surface was able to progress. This technique is applicable to the fabrication of nanodevices in any predetermined area isolated with SiO2 regions.

Original languageEnglish
Pages (from-to)L561-L563
JournalJapanese Journal of Applied Physics, Part 2: Letters
Issue number5 B
Publication statusPublished - 2003 May 15
Externally publishedYes


  • Anodic oxidation
  • Atomic force microscope (AFM)
  • Atomic step flow
  • Atomically flat surface
  • Step free
  • Step pattern controlling
  • Surface roughening
  • Wet etching

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


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