Effect of stress on tertiary recrystallized silicon iron

Akihiko Saito, Ken ichi Yamamoto, Kazushi Ishiyama, Ken ichi Arai

Research output: Contribution to journalArticlepeer-review


The effects of stress on the magnetization change for tertiary recrystallized silicon iron has been investigated. The processes of magnetization change due to tensile stress at various points on the hysteresis curve have been made clear. This material has an extremely small volume portion of 90° domains compared with high-grade commercial grain-oriented silicon iron sheet.

Original languageEnglish
Pages (from-to)229-231
Number of pages3
JournalJournal of Magnetism and Magnetic Materials
Issue number1-3
Publication statusPublished - 1992 Jul 1


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