Effect of surface free energy of underlayer materials on crystal growth of Co polycrystalline films

O. Kitakami; S. Okamoto; Y. Shimada

doi:10.1063/1.361510

Effect of surface free energy of underlayer materials on crystal growth of Co polycrystalline films

O. Kitakami, S. Okamoto, Y. Shimada

Division of Inorganic Material Research

Research output: Contribution to journal › Article › peer-review

37 Citations (Scopus)

Abstract

Crystallographic texture of polycrystalline Co films prepared by sputtering on a variety of underlayers has been investigated. The texture of polycrystalline Co films greatly depends on underlayer material, and this dependence is well explained by taking into account the surface free energy difference between the underlayer material (γ_u) and Co (γ_Co). When γ_u is larger than γ_Co, Co films can be grown with a well-defined Crystallographic texture of hcp-Co(001), which is the lowest surface energy crystal plane in order to minimize the total surface energy. In contrast, if γ_u is much smaller than γ_Co, no remarkable underlayer effects can be observed in the Crystallographic structure of Co films.

Original language	English
Pages (from-to)	6880-6883
Number of pages	4
Journal	Journal of Applied Physics
Volume	79
Issue number	9
DOIs	https://doi.org/10.1063/1.361510
Publication status	Published - 1996 May 1

ASJC Scopus subject areas

Physics and Astronomy(all)

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abstract = "Crystallographic texture of polycrystalline Co films prepared by sputtering on a variety of underlayers has been investigated. The texture of polycrystalline Co films greatly depends on underlayer material, and this dependence is well explained by taking into account the surface free energy difference between the underlayer material (γu) and Co (γCo). When γu is larger than γCo, Co films can be grown with a well-defined Crystallographic texture of hcp-Co(001), which is the lowest surface energy crystal plane in order to minimize the total surface energy. In contrast, if γu is much smaller than γCo, no remarkable underlayer effects can be observed in the Crystallographic structure of Co films.",

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N2 - Crystallographic texture of polycrystalline Co films prepared by sputtering on a variety of underlayers has been investigated. The texture of polycrystalline Co films greatly depends on underlayer material, and this dependence is well explained by taking into account the surface free energy difference between the underlayer material (γu) and Co (γCo). When γu is larger than γCo, Co films can be grown with a well-defined Crystallographic texture of hcp-Co(001), which is the lowest surface energy crystal plane in order to minimize the total surface energy. In contrast, if γu is much smaller than γCo, no remarkable underlayer effects can be observed in the Crystallographic structure of Co films.

AB - Crystallographic texture of polycrystalline Co films prepared by sputtering on a variety of underlayers has been investigated. The texture of polycrystalline Co films greatly depends on underlayer material, and this dependence is well explained by taking into account the surface free energy difference between the underlayer material (γu) and Co (γCo). When γu is larger than γCo, Co films can be grown with a well-defined Crystallographic texture of hcp-Co(001), which is the lowest surface energy crystal plane in order to minimize the total surface energy. In contrast, if γu is much smaller than γCo, no remarkable underlayer effects can be observed in the Crystallographic structure of Co films.

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Effect of surface free energy of underlayer materials on crystal growth of Co polycrystalline films

Abstract

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