Effects of doping elements on oxidation properties of low-activation vanadium alloys

M. Fujiwara, K. Natesan, M. Satou, A. Hasegawa, K. Abe, T. Takahashi, T. Sugawara, T. Shishido

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)


V-(4-5)Ti-(4-5)Cr type alloys doped with Si, Al and Y were studied in an effort to develop oxidation-proof vanadium alloys. In order to clarify the effects of the doping elements, the oxidation behavior of V-4Ti-4Cr, V-4Ti-4Cr-0.5Si, V-4Ti-4Cr-0.5Al and V-4T-4Cr-0.5Y alloys was studied. Thermogravimetric analysis (TGA) experiments in air at 400, 500, 620 and 650°C and exposure to air, helium and low oxygen partial pressure atmospheres at 500°C for 250h were carried out for each alloy. After exposure, measurement of mass gain and tensile tests were performed to study the influence of the exposure atmosphere on each alloy. After exposure to helium atmosphere with oxygen partial pressure Po2 = 20 Pa gave a smaller mass gain than that by the low oxygen partial pressure atmosphere of Po3 = 1.3 × 10-4 Pa. Tensile testing at room temperature showed that the V-4Ti-4Cr-0.5Si alloy has the highest ultimate tensile stress, and V-4Ti-4Cr-0.5Y has the highest total elong ation after exposure for all the atmospheres. The results of the TGA experiments in air show that yttrium doping is more effective at higher-temperature exposure. The V-4Ti-4Cr-0.5Y alloy has the highest oxidation-resistance at 620°C in all the alloys. The TGA data fit the parabolic oxidation law, especially in the first stage of oxidation time up to 30 h.

Original languageEnglish
Pages (from-to)1048-1051
Number of pages4
JournalMaterials Transactions
Issue number6
Publication statusPublished - 2001


  • Fusion reactor materials
  • Low activation materials
  • Mechanical properties
  • Oxidation
  • Vanadium alloys


Dive into the research topics of 'Effects of doping elements on oxidation properties of low-activation vanadium alloys'. Together they form a unique fingerprint.

Cite this