Effects of ion implantation damage on elevated source/drain formation for ultrathin body silicon on insulator metal oxide semiconductor field-effect transistor

Physics

• Ion Implantation 83%
• Semiconductor 33%
• Crystallinity 33%
• Field Effect 33%
• Spectroscopy 16%
• Surface Roughness 16%
• Atomic Force Microscopy 16%
• Backscattering 16%
• Silicon Films 16%
• Performance 16%
• Technology 16%
• High Speed 16%

Material Science

• Silicon on Insulator 100%
• Epitaxy 66%
• Semiconductor Material 33%
• Liquid Films 33%
• Morphology 33%

Engineering

• Crystallinity 33%
• Metal-Oxide-Semiconductor Field-Effect Transistor 33%
• Side Wall 16%
• Field-Emission Scanning Electron Microscopy 16%
• Performance 16%
• High Speed 16%