Effects of oxygen microbubbles on photoresist layers under hot water conditions

Masayoshi Takahashi; Yasuyuki Shirai; Akinobu Teramoto; Tunejirou Takahashi; Katsumi Tatera; Kouhei Matsuura; Hideo Horibe

doi:10.2494/photopolymer.29.643

Effects of oxygen microbubbles on photoresist layers under hot water conditions

Masayoshi Takahashi, Yasuyuki Shirai, Akinobu Teramoto, Tunejirou Takahashi, Katsumi Tatera, Kouhei Matsuura, Hideo Horibe

New Industry Creation Hatchery Center (NICHe)

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

We need to enhance the removing ability of microbubbles through the clear understanding of the functional mechanisms of microbubbles for the removal of photoresist layers. The purpose of the present study is to clarify the effect of microbubble on the surface of photoresist layers.

Original language	English
Pages (from-to)	643-646
Number of pages	4
Journal	Journal of Photopolymer Science and Technology
Volume	29
Issue number	4
DOIs	https://doi.org/10.2494/photopolymer.29.643
Publication status	Published - 2016

Keywords

Gas-water interface
High-dose ion-implantation
Microbubbles
Oxygen
Photoresist

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10.2494/photopolymer.29.643

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abstract = "We need to enhance the removing ability of microbubbles through the clear understanding of the functional mechanisms of microbubbles for the removal of photoresist layers. The purpose of the present study is to clarify the effect of microbubble on the surface of photoresist layers.",

keywords = "Gas-water interface, High-dose ion-implantation, Microbubbles, Oxygen, Photoresist",

author = "Masayoshi Takahashi and Yasuyuki Shirai and Akinobu Teramoto and Tunejirou Takahashi and Katsumi Tatera and Kouhei Matsuura and Hideo Horibe",

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AU - Takahashi, Masayoshi

AU - Shirai, Yasuyuki

AU - Teramoto, Akinobu

AU - Takahashi, Tunejirou

AU - Tatera, Katsumi

AU - Matsuura, Kouhei

AU - Horibe, Hideo

PY - 2016

Y1 - 2016

N2 - We need to enhance the removing ability of microbubbles through the clear understanding of the functional mechanisms of microbubbles for the removal of photoresist layers. The purpose of the present study is to clarify the effect of microbubble on the surface of photoresist layers.

AB - We need to enhance the removing ability of microbubbles through the clear understanding of the functional mechanisms of microbubbles for the removal of photoresist layers. The purpose of the present study is to clarify the effect of microbubble on the surface of photoresist layers.

KW - Gas-water interface

KW - High-dose ion-implantation

KW - Microbubbles

KW - Oxygen

KW - Photoresist

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Effects of oxygen microbubbles on photoresist layers under hot water conditions

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Keywords

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