TY - JOUR
T1 - Effects of temperature gradient in the growth of Si0.5Ge0.5 crystals by the traveling liquidus-zone method on board the International Space Station
AU - Kinoshita, K.
AU - Arai, Y.
AU - Inatomi, Y.
AU - Tsukada, T.
AU - Miyata, H.
AU - Tanaka, R.
N1 - Publisher Copyright:
© 2016 Elsevier B.V.
PY - 2016/12/1
Y1 - 2016/12/1
N2 - Si0.5Ge0.5 crystals were grown at two different temperature gradients on board the International Space Station (ISS) using the traveling liquidus-zone (TLZ) method and effects of temperature gradient on crystal quality were investigated. Although average axial Ge concentration profile was not affected by the temperature gradient, crystal quality was affected greatly. Single crystal length was shortened and constitutional supercooling (CS) is shown to occur more easily at higher temperature gradient. The calculated degree of CS based on the solute concentration profile in the melt and phase diagram data is about 4 times larger when the temperature gradient is twice, which supports the experimental results. Instability at high temperature gradient is unique to the TLZ method and is not common to other crystal growth methods such as the directional solidification method and Czochralski method.
AB - Si0.5Ge0.5 crystals were grown at two different temperature gradients on board the International Space Station (ISS) using the traveling liquidus-zone (TLZ) method and effects of temperature gradient on crystal quality were investigated. Although average axial Ge concentration profile was not affected by the temperature gradient, crystal quality was affected greatly. Single crystal length was shortened and constitutional supercooling (CS) is shown to occur more easily at higher temperature gradient. The calculated degree of CS based on the solute concentration profile in the melt and phase diagram data is about 4 times larger when the temperature gradient is twice, which supports the experimental results. Instability at high temperature gradient is unique to the TLZ method and is not common to other crystal growth methods such as the directional solidification method and Czochralski method.
KW - A1. Convection
KW - A1. Diffusion
KW - A2. Growth from solution
KW - A2. Traveling solvent zone growth
KW - B1. Germanium silicon alloys
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U2 - 10.1016/j.jcrysgro.2016.09.024
DO - 10.1016/j.jcrysgro.2016.09.024
M3 - Article
AN - SCOPUS:84988654932
SN - 0022-0248
VL - 455
SP - 49
EP - 54
JO - Journal of Crystal Growth
JF - Journal of Crystal Growth
ER -