Abstract
We have developed a new system in which thin films can be pulsed laser deposited under an external electric field. Application of 1 kV high voltage to a thin metal wire placed 1 mm above an edge of a 14 mm long substrate distributes electric fields ranging from 4500 V/cm at the left to 50 V/cm at the right side of the substrate. The crystallinity of the ZnO thin film was remarkably improved in the area where the electric field higher than +100 V/cm was applied during the film deposition. Thus, the film growth of ZnO with a strong polarity along the c-axis was verified to depend on an external electric field.
| Original language | English |
|---|---|
| Pages (from-to) | 807-809 |
| Number of pages | 3 |
| Journal | Applied Physics A: Materials Science and Processing |
| Volume | 79 |
| Issue number | 4-6 |
| DOIs | |
| Publication status | Published - 2004 |