Electrical investigation of notch width dependence of domain wall structure in Co/Ni Nanowires

Kouta Kondou; Ryo Hiramatsu; Tomohiro Koyama; Yoshinobu Nakatani; Daichi Chiba; Shunsuke Fukami; Nobuyuki Ishiwata; Teruo Ono

doi:10.1143/JJAP.50.073002

Electrical investigation of notch width dependence of domain wall structure in Co/Ni Nanowires

Kouta Kondou, Ryo Hiramatsu, Tomohiro Koyama, Yoshinobu Nakatani, Daichi Chiba, Shunsuke Fukami, Nobuyuki Ishiwata, Teruo Ono

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

We have investigated the notch width dependence of the domain wall structure by measuring the wall resistances in Co/Ni nanowires with perpendicular magnetization. Wall resistance was abruptly increased below a notch width of 43 nm. By comparing the experimental results with theoretical calculations of wall resistance and the micromagnetic simulation of wall energy, this increase in wall resistance was found to be caused by the change in the wall structure from the Bloch to Néel wall caused by the decreased notch width.

Original language	English
Article number	073002
Journal	Japanese Journal of Applied Physics
Volume	50
Issue number	7 PART 1
DOIs	https://doi.org/10.1143/JJAP.50.073002
Publication status	Published - 2011 Jul

Access to Document

10.1143/JJAP.50.073002

Cite this

@article{b43d93b098dc415c87e6b1b5fe884acd,

title = "Electrical investigation of notch width dependence of domain wall structure in Co/Ni Nanowires",

abstract = "We have investigated the notch width dependence of the domain wall structure by measuring the wall resistances in Co/Ni nanowires with perpendicular magnetization. Wall resistance was abruptly increased below a notch width of 43 nm. By comparing the experimental results with theoretical calculations of wall resistance and the micromagnetic simulation of wall energy, this increase in wall resistance was found to be caused by the change in the wall structure from the Bloch to N{\'e}el wall caused by the decreased notch width.",

author = "Kouta Kondou and Ryo Hiramatsu and Tomohiro Koyama and Yoshinobu Nakatani and Daichi Chiba and Shunsuke Fukami and Nobuyuki Ishiwata and Teruo Ono",

year = "2011",

month = jul,

doi = "10.1143/JJAP.50.073002",

language = "English",

volume = "50",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "7 PART 1",

}

TY - JOUR

T1 - Electrical investigation of notch width dependence of domain wall structure in Co/Ni Nanowires

AU - Kondou, Kouta

AU - Hiramatsu, Ryo

AU - Koyama, Tomohiro

AU - Nakatani, Yoshinobu

AU - Chiba, Daichi

AU - Fukami, Shunsuke

AU - Ishiwata, Nobuyuki

AU - Ono, Teruo

PY - 2011/7

Y1 - 2011/7

N2 - We have investigated the notch width dependence of the domain wall structure by measuring the wall resistances in Co/Ni nanowires with perpendicular magnetization. Wall resistance was abruptly increased below a notch width of 43 nm. By comparing the experimental results with theoretical calculations of wall resistance and the micromagnetic simulation of wall energy, this increase in wall resistance was found to be caused by the change in the wall structure from the Bloch to Néel wall caused by the decreased notch width.

AB - We have investigated the notch width dependence of the domain wall structure by measuring the wall resistances in Co/Ni nanowires with perpendicular magnetization. Wall resistance was abruptly increased below a notch width of 43 nm. By comparing the experimental results with theoretical calculations of wall resistance and the micromagnetic simulation of wall energy, this increase in wall resistance was found to be caused by the change in the wall structure from the Bloch to Néel wall caused by the decreased notch width.

UR - http://www.scopus.com/inward/record.url?scp=79960659195&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79960659195&partnerID=8YFLogxK

U2 - 10.1143/JJAP.50.073002

DO - 10.1143/JJAP.50.073002

M3 - Article

AN - SCOPUS:79960659195

SN - 0021-4922

VL - 50

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 7 PART 1

M1 - 073002

ER -

Electrical investigation of notch width dependence of domain wall structure in Co/Ni Nanowires

Abstract

Access to Document

Other files and links

Fingerprint

Cite this