Abstract
The performance of solar cells with stacked self-assembled Ge dots in the intrinsic region of Si-based p-i-n diode was reported. The dots were grown epitaxially on p-type Si(100) substrate via the Stranski-Krastanov growth mode by gas-source molecular beam epitaxy. The results obtained showed that electron-hole pairs generated in Ge dots can be efficiently separated by the internal electric field, and can contribute to the photocurrent without considerable recombination in Ge dots or at Ge/Si interfaces.
Original language | English |
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Pages (from-to) | 1258-1260 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 83 |
Issue number | 6 |
DOIs | |
Publication status | Published - 2003 Aug 11 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)