TY - JOUR
T1 - Enhancement of spin-orbit interaction of Cu thin films by oxidation treatment
AU - Enoki, Ryoto
AU - Gamou, Hiromu
AU - Kohda, Makoto
AU - Nitta, Junsaku
N1 - Funding Information:
Acknowledgments This work was supported by Grants-in-Aid for Scientific Research (15H05699, 15H02099, 15H05854, and 25220604) from the Japan Society for the Promotion of Science, the JSPS Core-to-Core program, and the Graduate Program in Spintronics at Tohoku University. The authors thank N. Akao and Y. Ohira for the measurement and analysis of XPS results.
Publisher Copyright:
© 2018 The Japan Society of Applied Physics.
PY - 2018/3
Y1 - 2018/3
N2 - We report the strength of spin-orbit interaction (SOI) and spin relaxation mechanisms for Cu oxide (CuOx) thin films with different oxidation procedures. The CuOx depth profiles are characterized by X-ray photoelectron spectroscopy. The spin-related properties are investigated on the basis of a quantum interference effect. The strength of SOI is more than four times larger for naturally oxidized CuOx films than for CuOx films fabricated by oxygen reactive sputtering. In addition, the spin relaxation process for naturally oxidized CuOx films is governed by both the D'yakonov-Perel' mechanism and the Elliott-Yafet mechanism, whereas that for CuOx films fabricated by oxygen reactive sputtering is dominated by the Elliott-Yafet mechanism.
AB - We report the strength of spin-orbit interaction (SOI) and spin relaxation mechanisms for Cu oxide (CuOx) thin films with different oxidation procedures. The CuOx depth profiles are characterized by X-ray photoelectron spectroscopy. The spin-related properties are investigated on the basis of a quantum interference effect. The strength of SOI is more than four times larger for naturally oxidized CuOx films than for CuOx films fabricated by oxygen reactive sputtering. In addition, the spin relaxation process for naturally oxidized CuOx films is governed by both the D'yakonov-Perel' mechanism and the Elliott-Yafet mechanism, whereas that for CuOx films fabricated by oxygen reactive sputtering is dominated by the Elliott-Yafet mechanism.
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U2 - 10.7567/APEX.11.033001
DO - 10.7567/APEX.11.033001
M3 - Article
AN - SCOPUS:85044972693
SN - 1882-0778
VL - 11
JO - Applied Physics Express
JF - Applied Physics Express
IS - 3
M1 - 033001
ER -