Epitaxial growth of C60 thin films using continuous-wave laser molecular beam epitaxy

Seiichiro Yaginuma; Kenji Itaka; Masamitsu Haemori; Masao Katayama; Yuji Matsumoto; Hideomi Koinuma

doi:10.1557/proc-0965-s14-06

Epitaxial growth of C₆₀ thin films using continuous-wave laser molecular beam epitaxy

Seiichiro Yaginuma, Kenji Itaka, Masamitsu Haemori, Masao Katayama, Yuji Matsumoto, Hideomi Koinuma

ENG - Applied Chemistry

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

We have fabricated C₆₀ thin films on various substrates (mica, MoS₂, HOPG, LiF, NaCl, KBr, KCl and CaF₂) by using continuous-wave laser molecular beam epitaxy (CWL-MBE), which is very suitable technique to grow epitaxial organic thin films because of good controllability of evaporation as compared with Knudsen-cell method. The films were evaluated by reflection high-energy electron diffraction with micro channel imaging plate (MCP-RHEED) and atomic force microscopy (AFM). AFM images of the C₆₀ films on mica, MoS₂ and HOPG substrates show flat and homogeneous, morphology, and epitaxial growth of the films on mica and MoS₂ substrates were observed by RHEED. This result shows mica, MoS₂, HOPG substrates are good candidates for epitaxial growth of C₆₀ thin films.

Original language	English
Title of host publication	Organic Electronics
Subtitle of host publication	Materials, Devices and Applications
Publisher	Materials Research Society
Pages	223-227
Number of pages	5
ISBN (Print)	9781604234176
DOIs	https://doi.org/10.1557/proc-0965-s14-06
Publication status	Published - 2006
Event	2006 MRS Fall Meeting - Boston, MA, United States Duration: 2006 Nov 27 → 2006 Dec 1

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	965
ISSN (Print)	0272-9172

Conference

Conference	2006 MRS Fall Meeting
Country/Territory	United States
City	Boston, MA
Period	06/11/27 → 06/12/1

Access to Document

10.1557/proc-0965-s14-06

Cite this

Yaginuma, S., Itaka, K., Haemori, M., Katayama, M., Matsumoto, Y., & Koinuma, H. (2006). Epitaxial growth of C₆₀ thin films using continuous-wave laser molecular beam epitaxy. In Organic Electronics: Materials, Devices and Applications (pp. 223-227). (Materials Research Society Symposium Proceedings; Vol. 965). Materials Research Society. https://doi.org/10.1557/proc-0965-s14-06

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title = "Epitaxial growth of C60 thin films using continuous-wave laser molecular beam epitaxy",

abstract = "We have fabricated C60 thin films on various substrates (mica, MoS2, HOPG, LiF, NaCl, KBr, KCl and CaF2) by using continuous-wave laser molecular beam epitaxy (CWL-MBE), which is very suitable technique to grow epitaxial organic thin films because of good controllability of evaporation as compared with Knudsen-cell method. The films were evaluated by reflection high-energy electron diffraction with micro channel imaging plate (MCP-RHEED) and atomic force microscopy (AFM). AFM images of the C60 films on mica, MoS2 and HOPG substrates show flat and homogeneous, morphology, and epitaxial growth of the films on mica and MoS2 substrates were observed by RHEED. This result shows mica, MoS2, HOPG substrates are good candidates for epitaxial growth of C60 thin films.",

author = "Seiichiro Yaginuma and Kenji Itaka and Masamitsu Haemori and Masao Katayama and Yuji Matsumoto and Hideomi Koinuma",

year = "2006",

doi = "10.1557/proc-0965-s14-06",

language = "English",

isbn = "9781604234176",

series = "Materials Research Society Symposium Proceedings",

publisher = "Materials Research Society",

pages = "223--227",

booktitle = "Organic Electronics",

note = "2006 MRS Fall Meeting ; Conference date: 27-11-2006 Through 01-12-2006",

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Yaginuma, S, Itaka, K, Haemori, M, Katayama, M, Matsumoto, Y & Koinuma, H 2006, Epitaxial growth of C₆₀ thin films using continuous-wave laser molecular beam epitaxy. in Organic Electronics: Materials, Devices and Applications. Materials Research Society Symposium Proceedings, vol. 965, Materials Research Society, pp. 223-227, 2006 MRS Fall Meeting, Boston, MA, United States, 06/11/27. https://doi.org/10.1557/proc-0965-s14-06

Epitaxial growth of C₆₀ thin films using continuous-wave laser molecular beam epitaxy. / Yaginuma, Seiichiro; Itaka, Kenji; Haemori, Masamitsu et al.
Organic Electronics: Materials, Devices and Applications. Materials Research Society, 2006. p. 223-227 (Materials Research Society Symposium Proceedings; Vol. 965).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Epitaxial growth of C60 thin films using continuous-wave laser molecular beam epitaxy

AU - Yaginuma, Seiichiro

AU - Itaka, Kenji

AU - Haemori, Masamitsu

AU - Katayama, Masao

AU - Matsumoto, Yuji

AU - Koinuma, Hideomi

PY - 2006

Y1 - 2006

N2 - We have fabricated C60 thin films on various substrates (mica, MoS2, HOPG, LiF, NaCl, KBr, KCl and CaF2) by using continuous-wave laser molecular beam epitaxy (CWL-MBE), which is very suitable technique to grow epitaxial organic thin films because of good controllability of evaporation as compared with Knudsen-cell method. The films were evaluated by reflection high-energy electron diffraction with micro channel imaging plate (MCP-RHEED) and atomic force microscopy (AFM). AFM images of the C60 films on mica, MoS2 and HOPG substrates show flat and homogeneous, morphology, and epitaxial growth of the films on mica and MoS2 substrates were observed by RHEED. This result shows mica, MoS2, HOPG substrates are good candidates for epitaxial growth of C60 thin films.

AB - We have fabricated C60 thin films on various substrates (mica, MoS2, HOPG, LiF, NaCl, KBr, KCl and CaF2) by using continuous-wave laser molecular beam epitaxy (CWL-MBE), which is very suitable technique to grow epitaxial organic thin films because of good controllability of evaporation as compared with Knudsen-cell method. The films were evaluated by reflection high-energy electron diffraction with micro channel imaging plate (MCP-RHEED) and atomic force microscopy (AFM). AFM images of the C60 films on mica, MoS2 and HOPG substrates show flat and homogeneous, morphology, and epitaxial growth of the films on mica and MoS2 substrates were observed by RHEED. This result shows mica, MoS2, HOPG substrates are good candidates for epitaxial growth of C60 thin films.

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