Epitaxial growth of FeSe0.5Te0.5 thin films on CaF2 substrates with high critical current density

Ichiro Tsukada; Masafumi Hanawa; Takanori Akiike; Fuyuki Nabeshima; Yoshinori Imai; Ataru Ichinose; Seiki Komiya; Tatsuo Hikage; Takahiko Kawaguchi; Hiroshi Ikuta; Atsutaka Maeda

doi:10.1143/APEX.4.053101

Epitaxial growth of FeSe_0.5Te_0.5 thin films on CaF₂ substrates with high critical current density

Ichiro Tsukada, Masafumi Hanawa, Takanori Akiike, Fuyuki Nabeshima, Yoshinori Imai, Ataru Ichinose, Seiki Komiya, Tatsuo Hikage, Takahiko Kawaguchi, Hiroshi Ikuta, Atsutaka Maeda

SCI - Physics

Research output: Contribution to journal › Article › peer-review

71 Citations (Scopus)

Abstract

In-situ epitaxial growth of FeSe_0.5Te_0.5 thin films is demonstrated on a nonoxide substrate CaF₂. Structural analysis reveals that compressive stress is moderately added to 36-nm-thick FeSe _0.5Te_0.5, which pushes up the critical temperature to above 15K, showing higher values than that of bulk crystals. The critical current density at T = 4.5 K reaches 5.9 × 10⁴ A cm ^-2 at μ₀H= 10T, and 4.2 × 10⁴Acm ^-2 at μ₀H = 14T. These results indicate that fluoride substrates have high potential for the growth of iron-based superconductors in comparison with popular oxide substrates.

Original language	English
Journal	Applied Physics Express
Volume	4
Issue number	5
DOIs	https://doi.org/10.1143/APEX.4.053101
Publication status	Published - 2011 May

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@article{8566a9acb33a49469703e0b3a17ce5c7,

title = "Epitaxial growth of FeSe0.5Te0.5 thin films on CaF2 substrates with high critical current density",

abstract = "In-situ epitaxial growth of FeSe0.5Te0.5 thin films is demonstrated on a nonoxide substrate CaF2. Structural analysis reveals that compressive stress is moderately added to 36-nm-thick FeSe 0.5Te0.5, which pushes up the critical temperature to above 15K, showing higher values than that of bulk crystals. The critical current density at T = 4.5 K reaches 5.9 × 104 A cm -2 at μ0H= 10T, and 4.2 × 104Acm -2 at μ0H = 14T. These results indicate that fluoride substrates have high potential for the growth of iron-based superconductors in comparison with popular oxide substrates.",

author = "Ichiro Tsukada and Masafumi Hanawa and Takanori Akiike and Fuyuki Nabeshima and Yoshinori Imai and Ataru Ichinose and Seiki Komiya and Tatsuo Hikage and Takahiko Kawaguchi and Hiroshi Ikuta and Atsutaka Maeda",

year = "2011",

month = may,

doi = "10.1143/APEX.4.053101",

language = "English",

volume = "4",

journal = "Applied Physics Express",

issn = "1882-0778",

publisher = "Japan Society of Applied Physics",

number = "5",

}

TY - JOUR

T1 - Epitaxial growth of FeSe0.5Te0.5 thin films on CaF2 substrates with high critical current density

AU - Tsukada, Ichiro

AU - Hanawa, Masafumi

AU - Akiike, Takanori

AU - Nabeshima, Fuyuki

AU - Imai, Yoshinori

AU - Ichinose, Ataru

AU - Komiya, Seiki

AU - Hikage, Tatsuo

AU - Kawaguchi, Takahiko

AU - Ikuta, Hiroshi

AU - Maeda, Atsutaka

PY - 2011/5

Y1 - 2011/5

N2 - In-situ epitaxial growth of FeSe0.5Te0.5 thin films is demonstrated on a nonoxide substrate CaF2. Structural analysis reveals that compressive stress is moderately added to 36-nm-thick FeSe 0.5Te0.5, which pushes up the critical temperature to above 15K, showing higher values than that of bulk crystals. The critical current density at T = 4.5 K reaches 5.9 × 104 A cm -2 at μ0H= 10T, and 4.2 × 104Acm -2 at μ0H = 14T. These results indicate that fluoride substrates have high potential for the growth of iron-based superconductors in comparison with popular oxide substrates.

AB - In-situ epitaxial growth of FeSe0.5Te0.5 thin films is demonstrated on a nonoxide substrate CaF2. Structural analysis reveals that compressive stress is moderately added to 36-nm-thick FeSe 0.5Te0.5, which pushes up the critical temperature to above 15K, showing higher values than that of bulk crystals. The critical current density at T = 4.5 K reaches 5.9 × 104 A cm -2 at μ0H= 10T, and 4.2 × 104Acm -2 at μ0H = 14T. These results indicate that fluoride substrates have high potential for the growth of iron-based superconductors in comparison with popular oxide substrates.

UR - http://www.scopus.com/inward/record.url?scp=79956091018&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79956091018&partnerID=8YFLogxK

U2 - 10.1143/APEX.4.053101

DO - 10.1143/APEX.4.053101

M3 - Article

AN - SCOPUS:79956091018

SN - 1882-0778

VL - 4

JO - Applied Physics Express

JF - Applied Physics Express

IS - 5

ER -

Epitaxial growth of FeSe_0.5Te_0.5 thin films on CaF₂ substrates with high critical current density

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