TY - JOUR
T1 - Epitaxial growth of vanadium films evaporated on nacl substrates
AU - Yamada, Yukio
AU - Kasukabe, Yoshitaka
PY - 1992/12
Y1 - 1992/12
N2 - The epitaxial growth of vanadium (V) films evaporated on an NaCl cleavage surface has been studied by electron microscopy. It has been found that body-centered tetragonal (bct) VHx (x≲0.1; a=0.301 nm, c=0.312 nm) and NaCl- type VOy (y≒1.0; a' =0.408 nm) are formed on the substrate held at 270°C in the early growth stage of the film. With increasing film thickness, body-centered cubic (bcc) V is formed. When the substrate temperature is raised up to 400°C, bcc V films (a=0.302 nm) grow from the early growth stage. On the other hand, bct VHx (x≒0.5; a=0.297 nm, c=0.338 nm) grows mainly when the substrate temperature is lowered to -170°C. The existence of oxygen and hydrogen atoms in the film was confirmed by nuclear reaction analysis and elastic recoil detection analysis respectively. The present paper has verified also that hydrogen and oxygen atoms which dissolve in V films, escape from the NaCl substrate.
AB - The epitaxial growth of vanadium (V) films evaporated on an NaCl cleavage surface has been studied by electron microscopy. It has been found that body-centered tetragonal (bct) VHx (x≲0.1; a=0.301 nm, c=0.312 nm) and NaCl- type VOy (y≒1.0; a' =0.408 nm) are formed on the substrate held at 270°C in the early growth stage of the film. With increasing film thickness, body-centered cubic (bcc) V is formed. When the substrate temperature is raised up to 400°C, bcc V films (a=0.302 nm) grow from the early growth stage. On the other hand, bct VHx (x≒0.5; a=0.297 nm, c=0.338 nm) grows mainly when the substrate temperature is lowered to -170°C. The existence of oxygen and hydrogen atoms in the film was confirmed by nuclear reaction analysis and elastic recoil detection analysis respectively. The present paper has verified also that hydrogen and oxygen atoms which dissolve in V films, escape from the NaCl substrate.
KW - Evolution of hydrogen
KW - Formation of VH and VO
KW - NaCl substrate
KW - V-evaporated films
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U2 - 10.1143/JJAP.31.4010
DO - 10.1143/JJAP.31.4010
M3 - Article
AN - SCOPUS:0026981765
SN - 0021-4922
VL - 31
SP - 4010
EP - 4015
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 12 R
ER -