Abstract
The details of epitaxial growth and microstructural characteristics of ZnO films grown on (0001) sapphire were investigated using X-ray diffraction (XRD), reflection high energy electron diffraction (RHEED), and plan-view and cross-sectional transmission electron microscopy (TEM). The films were grown by electron cyclotron resonance-assisted molecular beam epitaxy (ECR-assisted MBE). The ECR-assisted MBE was found to be capable of growing high quality epitaxial ZnO films at low temperatures in comparison with chemical vapor deposition (CVD) and RF sputtering. The films exhibited a high degree of epitaxy, a sharp interface between film and substrate, and a smooth surface morphology. The TEM observations revealed that the films were epitaxial with an orientational relationship of (0001)ZnO ∥ (0001)Al2O3 and [1210]ZnO ∥ [1100]Al2O3. This is equivalent to a 30° rotation of ZnO relative to sapphire in (0001) plane.
Original language | English |
---|---|
Pages (from-to) | 781-785 |
Number of pages | 5 |
Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
Volume | 37 |
Issue number | 3 A |
DOIs | |
Publication status | Published - 1998 Mar |
Externally published | Yes |
Keywords
- ECR-assisted MBE
- Epitaxy
- TEM
- Zinc oxide
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)