TY - JOUR
T1 - Epitaxial L10-FeNi films with high degree of order and large uniaxial magnetic anisotropy fabricated by denitriding FeNiN films
AU - Ito, Keita
AU - Hayashida, Masahiro
AU - Masuda, Hiroto
AU - Nishio, Takahiro
AU - Goto, Sho
AU - Kura, Hiroaki
AU - Koganezawa, Tomoyuki
AU - Mizuguchi, Masaki
AU - Shimada, Yusuke
AU - Konno, Toyohiko J.
AU - Yanagihara, Hideto
AU - Takanashi, Koki
N1 - Funding Information:
We thank H. Onoda and T. Sekido, University of Tsukuba, for their support with the magnetic torque experiments. This work was supported by the Future Pioneering Program “Development of magnetic material technology for high-efficiency motors” (Proposal No. JPNP14015) commissioned by the New Energy and Industrial Technology Development Organization (NEDO), Japan. The conventional XRD measurements and EPMA analysis were carried out at the Cooperative Research and Development Center for Advanced Materials (CRDAM), Institute for Materials Research, Tohoku University (Proposal Nos. 18G0409 and 19G0402). The synchrotron radiation XRD measurements were conducted at the BL46XU of SPring-8 with the approval of JASRI (Proposal No.
Funding Information:
We thank H. Onoda and T. Sekido, University of Tsukuba, for their support with the magnetic torque experiments. This work was supported by the Future Pioneering Program ???Development of magnetic material technology for high-efficiency motors?? (Proposal No. JPNP14015) commissioned by the New Energy and Industrial Technology Development Organization (NEDO), Japan. The conventional XRD measurements and EPMA analysis were carried out at the Cooperative Research and Development Center for Advanced Materials (CRDAM), Institute for Materials Research, Tohoku University (Proposal Nos. 18G0409 and 19G0402). The synchrotron radiation XRD measurements were conducted at the BL46XU of SPring-8 with the approval of JASRI (Proposal No. 2019A1802). The STEM measurements were supported by the Tohoku University Microstructural Characterization Platform in Nanotechnology Platform Project sponsored by the Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan (Proposal No. JPMX09F-A-19-TU-0018).
Publisher Copyright:
© 2020 Author(s).
PY - 2020/6/15
Y1 - 2020/6/15
N2 - L10-orderd FeNi alloy films with a high degree of order (S) and a large uniaxial magnetic anisotropy energy (Ku) were realized by denitriding FeNiN films. FeNiN films with the a-axis perpendicular to the film plane were epitaxially grown on SrTiO3 (001) substrates by molecular beam epitaxy by changing the growth temperatures (TS) to 200, 250, and 350 °C. The a-axis oriented epitaxial L10-FeNi films were fabricated by annealing the FeNiN films in a H2 gas atmosphere at 300 °C. S and Ku of the denitrided L10-FeNi films were characterized by anomalous X-ray diffraction using synchrotron radiation and magnetic torque measurements, respectively. A high S of 0.87 and a Ku of 5.9 × 105 J/m3 were realized in the L10-FeNi film with a TS of 350 °C. This high S value exceeds the values reported on L10-FeNi to date, but the Ku value was comparable to those of c-axis oriented L10-FeNi films with S ∼0.5 grown by alternate monoatomic deposition of Fe and Ni layers. A possible origin for the suppressed macroscopic Ku in a-axis oriented L10-FeNi films is discussed, and denitriding FeNiN is a promising method for the fabrication of L10-FeNi with a high S and a large Ku.
AB - L10-orderd FeNi alloy films with a high degree of order (S) and a large uniaxial magnetic anisotropy energy (Ku) were realized by denitriding FeNiN films. FeNiN films with the a-axis perpendicular to the film plane were epitaxially grown on SrTiO3 (001) substrates by molecular beam epitaxy by changing the growth temperatures (TS) to 200, 250, and 350 °C. The a-axis oriented epitaxial L10-FeNi films were fabricated by annealing the FeNiN films in a H2 gas atmosphere at 300 °C. S and Ku of the denitrided L10-FeNi films were characterized by anomalous X-ray diffraction using synchrotron radiation and magnetic torque measurements, respectively. A high S of 0.87 and a Ku of 5.9 × 105 J/m3 were realized in the L10-FeNi film with a TS of 350 °C. This high S value exceeds the values reported on L10-FeNi to date, but the Ku value was comparable to those of c-axis oriented L10-FeNi films with S ∼0.5 grown by alternate monoatomic deposition of Fe and Ni layers. A possible origin for the suppressed macroscopic Ku in a-axis oriented L10-FeNi films is discussed, and denitriding FeNiN is a promising method for the fabrication of L10-FeNi with a high S and a large Ku.
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U2 - 10.1063/5.0011875
DO - 10.1063/5.0011875
M3 - Article
AN - SCOPUS:85087548000
SN - 0003-6951
VL - 116
JO - Applied Physics Letters
JF - Applied Physics Letters
IS - 24
M1 - 242404
ER -