TY - JOUR
T1 - Epitaxial wurtzite-MgZnO barrier based magnetic tunnel junctions deposited on a metallic ferromagnetic electrode
AU - Belmoubarik, M.
AU - Al-Mahdawi, M.
AU - Sato, H.
AU - Nozaki, T.
AU - Sahashi, M.
N1 - Publisher Copyright:
© 2015 AIP Publishing LLC.
PY - 2015/6/22
Y1 - 2015/6/22
N2 - An epitaxial wurtzite (WZ) Mg0.23Zn0.77O barrier based magnetic tunnel junction (MTJ), with electrode-barrier structure of Co0.30Pt0.70 (111)/Mg0.23Zn0.77O (0001)/Co (0001), was fabricated. The good crystallinity and tunneling properties were experimentally confirmed. Electrical and magnetic investigations demonstrated its high resistance-area product of 1.05 MΩ μm2, a maximum tunneling magneto-resistance (TMR) of 35.5%, and the existence of localized states within the tunneling barrier producing TMR rapid decrease and oscillation when increasing the applied bias voltage. The TMR value almost vanished at 200 K, which was attributed to the induced moment and strong spin-orbit coupling in Pt atoms at the Co0.30Pt0.70/Mg0.23Zn0.77O interface. Owing to the ferroelectric behavior in WZ-MgZnO materials, the fabrication of WZ-MgZnO barrier based MTJs deposited on a metallic ferromagnetic electrode will open routes for electrically controllable non-volatile devices that are compatible with CMOS technology.
AB - An epitaxial wurtzite (WZ) Mg0.23Zn0.77O barrier based magnetic tunnel junction (MTJ), with electrode-barrier structure of Co0.30Pt0.70 (111)/Mg0.23Zn0.77O (0001)/Co (0001), was fabricated. The good crystallinity and tunneling properties were experimentally confirmed. Electrical and magnetic investigations demonstrated its high resistance-area product of 1.05 MΩ μm2, a maximum tunneling magneto-resistance (TMR) of 35.5%, and the existence of localized states within the tunneling barrier producing TMR rapid decrease and oscillation when increasing the applied bias voltage. The TMR value almost vanished at 200 K, which was attributed to the induced moment and strong spin-orbit coupling in Pt atoms at the Co0.30Pt0.70/Mg0.23Zn0.77O interface. Owing to the ferroelectric behavior in WZ-MgZnO materials, the fabrication of WZ-MgZnO barrier based MTJs deposited on a metallic ferromagnetic electrode will open routes for electrically controllable non-volatile devices that are compatible with CMOS technology.
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U2 - 10.1063/1.4923041
DO - 10.1063/1.4923041
M3 - Article
AN - SCOPUS:84933073864
SN - 0003-6951
VL - 106
JO - Applied Physics Letters
JF - Applied Physics Letters
IS - 25
M1 - 252403
ER -