Epitaxially grown L10-FePt/(C, SiO2, and Al2O3) granular films

Satoshi Okamoto; Osamu Kitakami

doi:10.1016/j.jmmm.2006.11.108

Epitaxially grown L1₀-FePt/(C, SiO₂, and Al₂O₃) granular films

Satoshi Okamoto, Osamu Kitakami

IMRAM - Division of Inorganic Material Research

Tohoku University

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

Additive effects of C, SiO₂, and Al₂O₃ on L1₀-FePt epitaxial thin film were studied. Samples were fabricated by co-sputtering of FePt and (C, SiO₂, and Al₂O₃) on MgO (1 0 0) substrate at 973 K. These additives effectively reduce the particle size of FePt. C additive deteriorates the crystal orientation, while Al₂O₃ additive gradually degrades the L1₀ ordering. On the other hand, SiO₂ additive can reduce the particle size while keeping the high c-axis orientation and higher degree of L1₀ ordering.

Original language	English
Pages (from-to)	2367-2368
Number of pages	2
Journal	Journal of Magnetism and Magnetic Materials
Volume	310
Issue number	2 SUPPL. PART 3
DOIs	https://doi.org/10.1016/j.jmmm.2006.11.108
Publication status	Published - 2007 Mar

Keywords

Epitaxial growth
FePt
Granular
Magnetic recording

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10.1016/j.jmmm.2006.11.108

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title = "Epitaxially grown L10-FePt/(C, SiO2, and Al2O3) granular films",

abstract = "Additive effects of C, SiO2, and Al2O3 on L10-FePt epitaxial thin film were studied. Samples were fabricated by co-sputtering of FePt and (C, SiO2, and Al2O3) on MgO (1 0 0) substrate at 973 K. These additives effectively reduce the particle size of FePt. C additive deteriorates the crystal orientation, while Al2O3 additive gradually degrades the L10 ordering. On the other hand, SiO2 additive can reduce the particle size while keeping the high c-axis orientation and higher degree of L10 ordering.",

keywords = "Epitaxial growth, FePt, Granular, Magnetic recording",

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T1 - Epitaxially grown L10-FePt/(C, SiO2, and Al2O3) granular films

AU - Okamoto, Satoshi

AU - Kitakami, Osamu

PY - 2007/3

Y1 - 2007/3

N2 - Additive effects of C, SiO2, and Al2O3 on L10-FePt epitaxial thin film were studied. Samples were fabricated by co-sputtering of FePt and (C, SiO2, and Al2O3) on MgO (1 0 0) substrate at 973 K. These additives effectively reduce the particle size of FePt. C additive deteriorates the crystal orientation, while Al2O3 additive gradually degrades the L10 ordering. On the other hand, SiO2 additive can reduce the particle size while keeping the high c-axis orientation and higher degree of L10 ordering.

AB - Additive effects of C, SiO2, and Al2O3 on L10-FePt epitaxial thin film were studied. Samples were fabricated by co-sputtering of FePt and (C, SiO2, and Al2O3) on MgO (1 0 0) substrate at 973 K. These additives effectively reduce the particle size of FePt. C additive deteriorates the crystal orientation, while Al2O3 additive gradually degrades the L10 ordering. On the other hand, SiO2 additive can reduce the particle size while keeping the high c-axis orientation and higher degree of L10 ordering.

KW - Epitaxial growth

KW - FePt

KW - Granular

KW - Magnetic recording

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Epitaxially grown L1₀-FePt/(C, SiO₂, and Al₂O₃) granular films

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Keywords

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