Additive effects of C, SiO2, and Al2O3 on L10-FePt epitaxial thin film were studied. Samples were fabricated by co-sputtering of FePt and (C, SiO2, and Al2O3) on MgO (1 0 0) substrate at 973 K. These additives effectively reduce the particle size of FePt. C additive deteriorates the crystal orientation, while Al2O3 additive gradually degrades the L10 ordering. On the other hand, SiO2 additive can reduce the particle size while keeping the high c-axis orientation and higher degree of L10 ordering.
- Epitaxial growth
- Magnetic recording