Erratum: Reduction of ultraviolet-radiation damage in SiO2 using pulse-time-modulated plasma and its application to charge-coupled 44 image-sensor processes (Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures (2003) 21 (2448))

Mitsuru Okigawa; Yasushi Ishikawa; Seiji Samukawa

Erratum: Reduction of ultraviolet-radiation damage in SiO₂ using pulse-time-modulated plasma and its application to charge-coupled 44 image-sensor processes (Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures (2003) 21 (2448))

Mitsuru Okigawa, Yasushi Ishikawa, Seiji Samukawa

Innovative Energy Research Center

Research output: Contribution to journal › Comment/debate › peer-review

Original language	English
Number of pages	1
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	22
Issue number	2
Publication status	Published - 2004 Mar 1

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

Cite this

Okigawa, M., Ishikawa, Y., & Samukawa, S. (2004). Erratum: Reduction of ultraviolet-radiation damage in SiO₂ using pulse-time-modulated plasma and its application to charge-coupled 44 image-sensor processes (Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures (2003) 21 (2448)). Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 22(2).

Erratum: Reduction of ultraviolet-radiation damage in SiO₂ using pulse-time-modulated plasma and its application to charge-coupled 44 image-sensor processes (Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures (2003) 21 (2448)). / Okigawa, Mitsuru; Ishikawa, Yasushi; Samukawa, Seiji.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 22, No. 2, 01.03.2004.

Research output: Contribution to journal › Comment/debate › peer-review

Okigawa, M, Ishikawa, Y & Samukawa, S 2004, 'Erratum: Reduction of ultraviolet-radiation damage in SiO₂ using pulse-time-modulated plasma and its application to charge-coupled 44 image-sensor processes (Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures (2003) 21 (2448))', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 22, no. 2.

Okigawa M, Ishikawa Y, Samukawa S. Erratum: Reduction of ultraviolet-radiation damage in SiO₂ using pulse-time-modulated plasma and its application to charge-coupled 44 image-sensor processes (Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures (2003) 21 (2448)). Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2004 Mar 1;22(2).

Okigawa, Mitsuru ; Ishikawa, Yasushi ; Samukawa, Seiji. / Erratum : Reduction of ultraviolet-radiation damage in SiO₂ using pulse-time-modulated plasma and its application to charge-coupled 44 image-sensor processes (Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures (2003) 21 (2448)). In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2004 ; Vol. 22, No. 2.

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Erratum: Reduction of ultraviolet-radiation damage in SiO2 using pulse-time-modulated plasma and its application to charge-coupled 44 image-sensor processes (Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures (2003) 21 (2448))

ASJC Scopus subject areas

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Cite this

Erratum: Reduction of ultraviolet-radiation damage in SiO₂ using pulse-time-modulated plasma and its application to charge-coupled 44 image-sensor processes (Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures (2003) 21 (2448))