Erratum: Study on the adhesion strength of CVD-Cu films with CVD/ALD-Co(W) underlayers made using carbonyl precursors (ECS Solid State Letters (2014) 3 (P20))

Kohei Shima, Hideharu Shimizu, Takeshi Momose, Yukihiro Shimogaki

Research output: Contribution to journalComment/debatepeer-review

Original languageEnglish
Pages (from-to)X5
JournalECS Solid State Letters
Issue number10
Publication statusPublished - 2014
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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