Erratum to "Motion of etch defects on (0 0 1) Li2B4O7 single crystal wafer" [Opt. Mater. 26 (2004) 479-482] (DOI:10.1016/j.optmat.2003.12.023)

Masahiro Yano; Noriko Watanabe; Satoshi Uda; Hiroyuki Shiraishi; Ichiro Sekine

doi:10.1016/j.optmat.2006.07.005

Erratum to "Motion of etch defects on (0 0 1) Li₂B₄O₇ single crystal wafer" [Opt. Mater. 26 (2004) 479-482] (DOI:10.1016/j.optmat.2003.12.023)

Masahiro Yano, Noriko Watanabe, Satoshi Uda, Hiroyuki Shiraishi, Ichiro Sekine

New Industry Creation Hatchery Center (NICHe)

Research output: Contribution to journal › Comment/debate

Original language	English
Pages (from-to)	449-450
Number of pages	2
Journal	Optical Materials
Volume	29
Issue number	4
DOIs	https://doi.org/10.1016/j.optmat.2006.07.005
Publication status	Published - 2006 Dec

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10.1016/j.optmat.2006.07.005

Cite this

@article{3bef91161b9e409cbabcda5778723f24,

title = "Erratum to {"}Motion of etch defects on (0 0 1) Li2B4O7 single crystal wafer{"} [Opt. Mater. 26 (2004) 479-482] (DOI:10.1016/j.optmat.2003.12.023)",

author = "Masahiro Yano and Noriko Watanabe and Satoshi Uda and Hiroyuki Shiraishi and Ichiro Sekine",

year = "2006",

month = dec,

doi = "10.1016/j.optmat.2006.07.005",

language = "English",

volume = "29",

pages = "449--450",

journal = "Optical Materials",

issn = "0925-3467",

publisher = "Elsevier",

number = "4",

}

TY - JOUR

T1 - Erratum to "Motion of etch defects on (0 0 1) Li2B4O7 single crystal wafer" [Opt. Mater. 26 (2004) 479-482] (DOI:10.1016/j.optmat.2003.12.023)

AU - Yano, Masahiro

AU - Watanabe, Noriko

AU - Uda, Satoshi

AU - Shiraishi, Hiroyuki

AU - Sekine, Ichiro

PY - 2006/12

Y1 - 2006/12

UR - http://www.scopus.com/inward/record.url?scp=33750705944&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33750705944&partnerID=8YFLogxK

U2 - 10.1016/j.optmat.2006.07.005

DO - 10.1016/j.optmat.2006.07.005

M3 - Comment/debate

AN - SCOPUS:33750705944

SN - 0925-3467

VL - 29

SP - 449

EP - 450

JO - Optical Materials

JF - Optical Materials

IS - 4

ER -

Erratum to "Motion of etch defects on (0 0 1) Li2B4O7 single crystal wafer" [Opt. Mater. 26 (2004) 479-482] (DOI:10.1016/j.optmat.2003.12.023)

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Erratum to "Motion of etch defects on (0 0 1) Li₂B₄O₇ single crystal wafer" [Opt. Mater. 26 (2004) 479-482] (DOI:10.1016/j.optmat.2003.12.023)