Evolution of hydride components generated by hydrogen plasma irradiation of a si(110) surface investigated with in situ infrared absorption spectroscopy in multiple internal reflection geometry

Masanori Shinohara; Yoshiki Takami; Susumu Takabayashi; Akinori Oda; Yoshinobu Matsuda; Hiroshi Fujiyama

doi:10.1109/TPS.2013.2263850

Evolution of hydride components generated by hydrogen plasma irradiation of a si(110) surface investigated with in situ infrared absorption spectroscopy in multiple internal reflection geometry

Masanori Shinohara, Yoshiki Takami, Susumu Takabayashi, Akinori Oda, Yoshinobu Matsuda, Hiroshi Fujiyama

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

The process of hydrogen plasma reacting with a Si(110) surface is investigated. The reaction process is measured with in situ infrared absorption spectroscopy (IRAS) in multiple internal reflection geometry. We monitor the evolution of hydride components in the Si(110) surface exposed to the hydrogen plasma. IRAS data show that the surface atomic arrangement of a Si(110) surface is distorted by plasma exposure. H is inserted into Si crystal and defects and vacancies are generated. Further, hydrogen plasma exposure creates silicon dihydride (SiH-2) components in an amorphous layer. The rm SiH₂ formation rate is 0.5, by a comparison with the hydrogen plasma exposure time.

Original language	English
Article number	6529170
Pages (from-to)	1878-1883
Number of pages	6
Journal	IEEE Transactions on Plasma Science
Volume	41
Issue number	8
DOIs	https://doi.org/10.1109/TPS.2013.2263850
Publication status	Published - 2013
Externally published	Yes

Keywords

Amorphous
Si(110)
defect
hydrogen plasma
silicon hydride
vacancy

ASJC Scopus subject areas

Nuclear and High Energy Physics
Condensed Matter Physics

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10.1109/TPS.2013.2263850

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Shinohara, M., Takami, Y., Takabayashi, S., Oda, A., Matsuda, Y., & Fujiyama, H. (2013). Evolution of hydride components generated by hydrogen plasma irradiation of a si(110) surface investigated with in situ infrared absorption spectroscopy in multiple internal reflection geometry. IEEE Transactions on Plasma Science, 41(8), 1878-1883. [6529170]. https://doi.org/10.1109/TPS.2013.2263850

Evolution of hydride components generated by hydrogen plasma irradiation of a si(110) surface investigated with in situ infrared absorption spectroscopy in multiple internal reflection geometry. / Shinohara, Masanori; Takami, Yoshiki; Takabayashi, Susumu et al.

In: IEEE Transactions on Plasma Science, Vol. 41, No. 8, 6529170, 2013, p. 1878-1883.

Research output: Contribution to journal › Article › peer-review

Shinohara, M, Takami, Y, Takabayashi, S, Oda, A, Matsuda, Y & Fujiyama, H 2013, 'Evolution of hydride components generated by hydrogen plasma irradiation of a si(110) surface investigated with in situ infrared absorption spectroscopy in multiple internal reflection geometry', IEEE Transactions on Plasma Science, vol. 41, no. 8, 6529170, pp. 1878-1883. https://doi.org/10.1109/TPS.2013.2263850

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abstract = "The process of hydrogen plasma reacting with a Si(110) surface is investigated. The reaction process is measured with in situ infrared absorption spectroscopy (IRAS) in multiple internal reflection geometry. We monitor the evolution of hydride components in the Si(110) surface exposed to the hydrogen plasma. IRAS data show that the surface atomic arrangement of a Si(110) surface is distorted by plasma exposure. H is inserted into Si crystal and defects and vacancies are generated. Further, hydrogen plasma exposure creates silicon dihydride (SiH-2) components in an amorphous layer. The rm SiH2 formation rate is 0.5, by a comparison with the hydrogen plasma exposure time.",

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author = "Masanori Shinohara and Yoshiki Takami and Susumu Takabayashi and Akinori Oda and Yoshinobu Matsuda and Hiroshi Fujiyama",

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AU - Matsuda, Yoshinobu

AU - Fujiyama, Hiroshi

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Evolution of hydride components generated by hydrogen plasma irradiation of a si(110) surface investigated with in situ infrared absorption spectroscopy in multiple internal reflection geometry

Abstract

Keywords

ASJC Scopus subject areas

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