Examination of surface-roughness of silicon crystals by double-crystal x-ray topography

Michio Niwano; Tadashi Kobayashi; Nobuo Miyamoto

doi:10.1143/JJAP.27.1113

Examination of surface-roughness of silicon crystals by double-crystal x-ray topography

Michio Niwano, Tadashi Kobayashi, Nobuo Miyamoto

Research output: Contribution to journal › Article › peer-review

Abstract

A new method of examining surface-roughness of silicon crystals, which uses the refraction effect in double-crystal X-ray topography, is proposed. It was shown that local slopes with an angle of inclination to a few tenths of a degree are detectable with this method.

Original language	English
Pages (from-to)	1113-1114
Number of pages	2
Journal	Japanese journal of applied physics
Volume	27
Issue number	6R
DOIs	https://doi.org/10.1143/JJAP.27.1113
Publication status	Published - 1988 Jun
Externally published	Yes

Keywords

Double-crystal method
Refraction effect
Silicon crystal
Surface-roughness
X-ray topography

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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10.1143/JJAP.27.1113

Cite this

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title = "Examination of surface-roughness of silicon crystals by double-crystal x-ray topography",

abstract = "A new method of examining surface-roughness of silicon crystals, which uses the refraction effect in double-crystal X-ray topography, is proposed. It was shown that local slopes with an angle of inclination to a few tenths of a degree are detectable with this method.",

keywords = "Double-crystal method, Refraction effect, Silicon crystal, Surface-roughness, X-ray topography",

author = "Michio Niwano and Tadashi Kobayashi and Nobuo Miyamoto",

year = "1988",

month = jun,

doi = "10.1143/JJAP.27.1113",

language = "English",

volume = "27",

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journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

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T1 - Examination of surface-roughness of silicon crystals by double-crystal x-ray topography

AU - Niwano, Michio

AU - Kobayashi, Tadashi

AU - Miyamoto, Nobuo

PY - 1988/6

Y1 - 1988/6

N2 - A new method of examining surface-roughness of silicon crystals, which uses the refraction effect in double-crystal X-ray topography, is proposed. It was shown that local slopes with an angle of inclination to a few tenths of a degree are detectable with this method.

AB - A new method of examining surface-roughness of silicon crystals, which uses the refraction effect in double-crystal X-ray topography, is proposed. It was shown that local slopes with an angle of inclination to a few tenths of a degree are detectable with this method.

KW - Double-crystal method

KW - Refraction effect

KW - Silicon crystal

KW - Surface-roughness

KW - X-ray topography

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U2 - 10.1143/JJAP.27.1113

DO - 10.1143/JJAP.27.1113

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AN - SCOPUS:0024019113

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JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

IS - 6R

ER -

Examination of surface-roughness of silicon crystals by double-crystal x-ray topography

Abstract

Keywords

ASJC Scopus subject areas

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