@inproceedings{2b3d6b4e890d4d4f8e180d84a360dbe7,
title = "Fabrication and characterization of elliptically-curved, laterally-graded multilayers for focusing X-ray polychromator applications",
abstract = "We have developed a novel X-ray multilayer working as a focusing polychromator. A multilayer mirror enables independent designs of the focal length and the spectral dispersion, and much higher throughput than the curved crystal. Our ion beam sputtering deposition apparatus has a speed programmable shuttering system for control of the lateral thickness gradient. A SiC/C and three V/C multilayers were deposited on each 150 mm long Si wafers. Period thicknesses are tuned to the designed energy of 5-12 keV, 12-19 keV, 19-26 keV and 26-33 keV, respectively. Four multilayers were clamped to form a 600 mm long 5-33 keV range elliptic mirror on a shaped Cu base plate. The focal length is 700 mm, which is large enough for setups around the sample position. The energy calibration was performed at BL-15C of the Photon Factory based on absorption edges of metal foils, which was in good agreement with the period thickness measured by a laboratory X-ray diffractometer.",
keywords = "X-ray, laterally graded, multilayer, polychromator, reflectometry",
author = "Tadashi Hatano and Tetsuo Harada and Tadashi Matsushita and Etsuo Arakawa and Yasuo Higashi",
year = "2010",
doi = "10.1063/1.3463296",
language = "English",
isbn = "9780735407824",
series = "AIP Conference Proceedings",
pages = "669--672",
booktitle = "SRI 2009 - The 10th International Conference on Synchrotron Radiation Instrumentation",
note = "10th International Conference on Synchrotron Radiation Instrumentation, SRI 2009 ; Conference date: 27-09-2009 Through 02-10-2009",
}