Fabrication of a multi-level lens using independent-exposure lithography and FAB plasma etching

Do Kyun Woo, Kazuhiro Hane, Sun Kyu Lee

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)


Micro lenses are needed for slim micro optical systems. A multi-level lens can be adapted to satisfy the requirements for a thin lens. Several techniques can be employed to produce multi-level lenses, including microelectromechanical system processes, laser fabrication, and mechanical manufacturing. In this study, a method involving independent-exposure lithography and fast atom beam plasma etching is presented for the fabrication of a multi-level lens. The advantages of the method are a non-repetitive process and precise fabrication due to the principle of independent exposure in the electron beam lithography process. The designed and produced multi-level lens reveals a four-level staircase, and has a focal length of 714.5 μm, a thickness of 0.723 μm, and a minimum width of 0.966 μm.

Original languageEnglish
Article number044001
JournalJournal of Optics A: Pure and Applied Optics
Issue number4
Publication statusPublished - 2008 Apr 1


  • FAB plasma etching
  • Independent-exposure lithography
  • Multi-level lens
  • Non-repetitive process
  • Proximity effect

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics


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