Fabrication of a multi-level lens using independent-exposure lithography and FAB plasma etching

Do Kyun Woo; Kazuhiro Hane; Cha Bum Lee; Sun Kyu Lee

doi:10.1109/OMEMS.2007.4373885

Fabrication of a multi-level lens using independent-exposure lithography and FAB plasma etching

Do Kyun Woo, Kazuhiro Hane, Cha Bum Lee, Sun Kyu Lee

ENG - Finemechanics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

Recently, a micro lens is need for the micro optical system requiring thin thickness. A multi-level lens can be adaptable to satisfy the requirement of this purpose. In this study, an independent-exposure of electron beam lithography and FAB plasma etching method are presented for the fabrication of a multi-level lens. The advantages of the method are the non-repetitive process and the precise fabrication due to the principle of the independent-exposure lithography.

Original language	English
Title of host publication	2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS
Pages	151-152
Number of pages	2
DOIs	https://doi.org/10.1109/OMEMS.2007.4373885
Publication status	Published - 2007 Dec 1
Event	2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS - Hualien, Taiwan, Province of China Duration: 2007 Aug 12 → 2007 Aug 16

Publication series

Name	2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS

Other

Other	2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS
Country/Territory	Taiwan, Province of China
City	Hualien
Period	07/8/12 → 07/8/16

Keywords

FAB plasma etching
Independent-exposure lithography
Multi-level lens
Non-repetitive process
Proximity effect

ASJC Scopus subject areas

Control and Systems Engineering
Electrical and Electronic Engineering

Access to Document

10.1109/OMEMS.2007.4373885

Cite this

Woo, D. K., Hane, K., Lee, C. B., & Lee, S. K. (2007). Fabrication of a multi-level lens using independent-exposure lithography and FAB plasma etching. In 2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS (pp. 151-152). [4373885] (2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS). https://doi.org/10.1109/OMEMS.2007.4373885

Fabrication of a multi-level lens using independent-exposure lithography and FAB plasma etching. / Woo, Do Kyun; Hane, Kazuhiro; Lee, Cha Bum et al.

2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS. 2007. p. 151-152 4373885 (2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Woo, DK, Hane, K, Lee, CB & Lee, SK 2007, Fabrication of a multi-level lens using independent-exposure lithography and FAB plasma etching. in 2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS., 4373885, 2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS, pp. 151-152, 2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS, Hualien, Taiwan, Province of China, 07/8/12. https://doi.org/10.1109/OMEMS.2007.4373885

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abstract = "Recently, a micro lens is need for the micro optical system requiring thin thickness. A multi-level lens can be adaptable to satisfy the requirement of this purpose. In this study, an independent-exposure of electron beam lithography and FAB plasma etching method are presented for the fabrication of a multi-level lens. The advantages of the method are the non-repetitive process and the precise fabrication due to the principle of the independent-exposure lithography.",

keywords = "FAB plasma etching, Independent-exposure lithography, Multi-level lens, Non-repetitive process, Proximity effect",

author = "Woo, {Do Kyun} and Kazuhiro Hane and Lee, {Cha Bum} and Lee, {Sun Kyu}",

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Y1 - 2007/12/1

N2 - Recently, a micro lens is need for the micro optical system requiring thin thickness. A multi-level lens can be adaptable to satisfy the requirement of this purpose. In this study, an independent-exposure of electron beam lithography and FAB plasma etching method are presented for the fabrication of a multi-level lens. The advantages of the method are the non-repetitive process and the precise fabrication due to the principle of the independent-exposure lithography.

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Fabrication of a multi-level lens using independent-exposure lithography and FAB plasma etching

Abstract

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Keywords

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