TY - JOUR
T1 - Fabrication of diffraction grating for X-ray Talbot interferometer
AU - Matsumoto, Masatake
AU - Takiguchi, Kinji
AU - Tanaka, Makoto
AU - Hunabiki, Yoichi
AU - Takeda, Hiroaki
AU - Momose, Atsushi
AU - Utsumi, Yuichi
AU - Hattori, Tadashi
PY - 2007/3
Y1 - 2007/3
N2 - Imaging technology using the phase data attracts attention from many researchers as the observation technique of a biomechanical material. We produced a diffraction grating for obtaining high-resolution phase data. We designed the new process flow and developed the fabrication technique composed of MEMS technology, X-ray lithography, and micro electroplating. The X-ray lithography process was performed using the NewSUBARU synchrotron radiation facility. The line and the aspect ratio of this grating were 4 μm and above 5 μm, respectively. We evaluated the diffraction grating in SPring-8.
AB - Imaging technology using the phase data attracts attention from many researchers as the observation technique of a biomechanical material. We produced a diffraction grating for obtaining high-resolution phase data. We designed the new process flow and developed the fabrication technique composed of MEMS technology, X-ray lithography, and micro electroplating. The X-ray lithography process was performed using the NewSUBARU synchrotron radiation facility. The line and the aspect ratio of this grating were 4 μm and above 5 μm, respectively. We evaluated the diffraction grating in SPring-8.
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U2 - 10.1007/s00542-006-0226-8
DO - 10.1007/s00542-006-0226-8
M3 - Article
AN - SCOPUS:33847336380
SN - 0946-7076
VL - 13
SP - 543
EP - 546
JO - Microsystem Technologies
JF - Microsystem Technologies
IS - 5-6
ER -