Fabrication of Einzel lens array with one-mask rie process for electron micro-optics

Eiichi Tomono; Hidetoshi Miyashita; Takahito Ono; Masayoshi Esashi

doi:10.1109/SENSOR.2009.5285809

Fabrication of Einzel lens array with one-mask rie process for electron micro-optics

Eiichi Tomono, Hidetoshi Miyashita, Takahito Ono, Masayoshi Esashi

ENG - Mechanical Systems Engineering

Tohoku University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Citation (Scopus)

Abstract

This paper reports the fabrication technique of electron micro-optics using silicon deep reactive ion etching. Stacked 120-μm-thick three silicon wafers stacked with cavities using patterned glass substrates are etched by "a direct cavity through etching technique". An array of the electron micro-optics consisted of three electrodes can be fabricated by one-mask process without alignment. The etched profiles of this cavity through etching are also investigated. This fabrication technology of electron lens is useful for making future multi-electron beam devices with electron optics.

Original language	English
Title of host publication	TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems
Pages	853-856
Number of pages	4
DOIs	https://doi.org/10.1109/SENSOR.2009.5285809
Publication status	Published - 2009
Event	TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems - Denver, CO, United States Duration: 2009 Jun 21 → 2009 Jun 25

Publication series

Name	TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems

Conference

Conference	TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems
Country/Territory	United States
City	Denver, CO
Period	09/6/21 → 09/6/25

Keywords

Deep reactive ion etching
Einzel lens
Electron micro-optics
Multi electron beam lithography

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10.1109/SENSOR.2009.5285809

Cite this

Tomono, E., Miyashita, H., Ono, T., & Esashi, M. (2009). Fabrication of Einzel lens array with one-mask rie process for electron micro-optics. In TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems (pp. 853-856). Article 5285809 (TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems). https://doi.org/10.1109/SENSOR.2009.5285809

Tomono, Eiichi ; Miyashita, Hidetoshi ; Ono, Takahito et al. / Fabrication of Einzel lens array with one-mask rie process for electron micro-optics. TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems. 2009. pp. 853-856 (TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems).

@inproceedings{0357b4ff6376426493b020af62da40c2,

title = "Fabrication of Einzel lens array with one-mask rie process for electron micro-optics",

abstract = "This paper reports the fabrication technique of electron micro-optics using silicon deep reactive ion etching. Stacked 120-μm-thick three silicon wafers stacked with cavities using patterned glass substrates are etched by {"}a direct cavity through etching technique{"}. An array of the electron micro-optics consisted of three electrodes can be fabricated by one-mask process without alignment. The etched profiles of this cavity through etching are also investigated. This fabrication technology of electron lens is useful for making future multi-electron beam devices with electron optics.",

keywords = "Deep reactive ion etching, Einzel lens, Electron micro-optics, Multi electron beam lithography",

author = "Eiichi Tomono and Hidetoshi Miyashita and Takahito Ono and Masayoshi Esashi",

year = "2009",

doi = "10.1109/SENSOR.2009.5285809",

language = "English",

isbn = "9781424441938",

series = "TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems",

pages = "853--856",

booktitle = "TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems",

note = "TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems ; Conference date: 21-06-2009 Through 25-06-2009",

}

Tomono, E, Miyashita, H, Ono, T & Esashi, M 2009, Fabrication of Einzel lens array with one-mask rie process for electron micro-optics. in TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems., 5285809, TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems, pp. 853-856, TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems, Denver, CO, United States, 09/6/21. https://doi.org/10.1109/SENSOR.2009.5285809

Fabrication of Einzel lens array with one-mask rie process for electron micro-optics. / Tomono, Eiichi; Miyashita, Hidetoshi; Ono, Takahito et al.
TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems. 2009. p. 853-856 5285809 (TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Fabrication of Einzel lens array with one-mask rie process for electron micro-optics

AU - Tomono, Eiichi

AU - Miyashita, Hidetoshi

AU - Ono, Takahito

AU - Esashi, Masayoshi

PY - 2009

Y1 - 2009

N2 - This paper reports the fabrication technique of electron micro-optics using silicon deep reactive ion etching. Stacked 120-μm-thick three silicon wafers stacked with cavities using patterned glass substrates are etched by "a direct cavity through etching technique". An array of the electron micro-optics consisted of three electrodes can be fabricated by one-mask process without alignment. The etched profiles of this cavity through etching are also investigated. This fabrication technology of electron lens is useful for making future multi-electron beam devices with electron optics.

AB - This paper reports the fabrication technique of electron micro-optics using silicon deep reactive ion etching. Stacked 120-μm-thick three silicon wafers stacked with cavities using patterned glass substrates are etched by "a direct cavity through etching technique". An array of the electron micro-optics consisted of three electrodes can be fabricated by one-mask process without alignment. The etched profiles of this cavity through etching are also investigated. This fabrication technology of electron lens is useful for making future multi-electron beam devices with electron optics.

KW - Deep reactive ion etching

KW - Einzel lens

KW - Electron micro-optics

KW - Multi electron beam lithography

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BT - TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems

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Tomono E, Miyashita H, Ono T, Esashi M. Fabrication of Einzel lens array with one-mask rie process for electron micro-optics. In TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems. 2009. p. 853-856. 5285809. (TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems). doi: 10.1109/SENSOR.2009.5285809

Fabrication of Einzel lens array with one-mask rie process for electron micro-optics

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