Abstract
This paper presents a fabrication process of fluxon devices using Nb/AlOx/Nb Josephson junction technologies with a Nb underlayer. Using the present technologies, fluxon devices have an excellent reproducibility of Josephson critical current density within ±21%, resistance values within ±9%, and inductance values within ±9%. In addition, fluxon-antifluxon collision behaviors were demonstrated using a Josephson sampling system as a typical example of fluxon devices.
Original language | English |
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Pages (from-to) | 1-8 |
Number of pages | 8 |
Journal | Denshi Gijutsu Sogo Kenkyusho Iho/Bulletin of the Electrotechnical Laboratory |
Volume | 57 |
Issue number | 11 |
Publication status | Published - 1993 Dec 1 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering