Fabrication of nano-gap electrodes using electroplating technique

Yoshiaki Kashimura; Hiroshi Nakashima; Kazuaki Furukawa; Keiichi Torimitsu

doi:10.1016/S0040-6090(03)00737-5

Fabrication of nano-gap electrodes using electroplating technique

Yoshiaki Kashimura, Hiroshi Nakashima, Kazuaki Furukawa, Keiichi Torimitsu

Research output: Contribution to journal › Conference article › peer-review

74 Citations (Scopus)

Abstract

We report a simple and controllable method for fabricating a pair of electrodes with a sub-10-nm gap, namely nano-gap electrodes, by using a conventional electroplating technique. A pair of initial electrodes with a 100-200 nm gap is fabricated by electron beam lithography, and then gold is deposited electrochemically to reduce this gap. A sub-10-nm gap is produced by halting the electroplating just before the electrodes make contact with each other. We also use our technique to fabricate nano-gap electrodes with a gold and a platinum finger, and with three gold fingers.

Original language	English
Pages (from-to)	317-321
Number of pages	5
Journal	Thin Solid Films
Volume	438-439
DOIs	https://doi.org/10.1016/S0040-6090(03)00737-5
Publication status	Published - 2003 Aug 22
Externally published	Yes
Event	The 5th International Conference on Nano-Molecular Electronics - Kobe, Japan Duration: 2002 Dec 10 → 2002 Dec 12

Keywords

Electroplating
Molecular electronics
Nano-gap electrode

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/S0040-6090(03)00737-5

Cite this

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title = "Fabrication of nano-gap electrodes using electroplating technique",

abstract = "We report a simple and controllable method for fabricating a pair of electrodes with a sub-10-nm gap, namely nano-gap electrodes, by using a conventional electroplating technique. A pair of initial electrodes with a 100-200 nm gap is fabricated by electron beam lithography, and then gold is deposited electrochemically to reduce this gap. A sub-10-nm gap is produced by halting the electroplating just before the electrodes make contact with each other. We also use our technique to fabricate nano-gap electrodes with a gold and a platinum finger, and with three gold fingers.",

keywords = "Electroplating, Molecular electronics, Nano-gap electrode",

author = "Yoshiaki Kashimura and Hiroshi Nakashima and Kazuaki Furukawa and Keiichi Torimitsu",

year = "2003",

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doi = "10.1016/S0040-6090(03)00737-5",

language = "English",

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journal = "Thin Solid Films",

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TY - JOUR

T1 - Fabrication of nano-gap electrodes using electroplating technique

AU - Kashimura, Yoshiaki

AU - Nakashima, Hiroshi

AU - Furukawa, Kazuaki

AU - Torimitsu, Keiichi

PY - 2003/8/22

Y1 - 2003/8/22

N2 - We report a simple and controllable method for fabricating a pair of electrodes with a sub-10-nm gap, namely nano-gap electrodes, by using a conventional electroplating technique. A pair of initial electrodes with a 100-200 nm gap is fabricated by electron beam lithography, and then gold is deposited electrochemically to reduce this gap. A sub-10-nm gap is produced by halting the electroplating just before the electrodes make contact with each other. We also use our technique to fabricate nano-gap electrodes with a gold and a platinum finger, and with three gold fingers.

AB - We report a simple and controllable method for fabricating a pair of electrodes with a sub-10-nm gap, namely nano-gap electrodes, by using a conventional electroplating technique. A pair of initial electrodes with a 100-200 nm gap is fabricated by electron beam lithography, and then gold is deposited electrochemically to reduce this gap. A sub-10-nm gap is produced by halting the electroplating just before the electrodes make contact with each other. We also use our technique to fabricate nano-gap electrodes with a gold and a platinum finger, and with three gold fingers.

KW - Electroplating

KW - Molecular electronics

KW - Nano-gap electrode

UR - http://www.scopus.com/inward/record.url?scp=0042026896&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0042026896&partnerID=8YFLogxK

U2 - 10.1016/S0040-6090(03)00737-5

DO - 10.1016/S0040-6090(03)00737-5

M3 - Conference article

AN - SCOPUS:0042026896

SN - 0040-6090

VL - 438-439

SP - 317

EP - 321

JO - Thin Solid Films

JF - Thin Solid Films

T2 - The 5th International Conference on Nano-Molecular Electronics

Y2 - 10 December 2002 through 12 December 2002

ER -

Fabrication of nano-gap electrodes using electroplating technique

Abstract

Keywords

ASJC Scopus subject areas

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